| Item type |
学術雑誌論文 / Journal Article(1) |
| 公開日 |
2016-09-08 |
| タイトル |
|
|
タイトル |
Effects of substrate temperature on structure and mechanical properties of sputter deposited fluorocarbon thin films |
|
言語 |
en |
| 言語 |
|
|
言語 |
eng |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
Rf sputtering |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
Thin film |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
PTFE |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
Fluorocarbon |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
Adhesion strength |
| 資源タイプ |
|
|
資源 |
http://purl.org/coar/resource_type/c_6501 |
|
タイプ |
journal article |
| アクセス権 |
|
|
アクセス権 |
open access |
|
アクセス権URI |
http://purl.org/coar/access_right/c_abf2 |
| 著者 |
Suzuki, Yuta
Fu, Haojie
Abe, Yoshio
Kawamura, Midori
|
| 抄録 |
|
|
内容記述タイプ |
Abstract |
|
内容記述 |
Fluorocarbon thin films were formed by radio-frequency magnetron sputtering using a polytetrafluoroethylene target with different substrate temperatures in the range −5 to 200 °C. Using X-ray diffraction and Fourier transform infrared spectroscopy, it was confirmed that the films were amorphous and contained C–F bonds. X-ray photoelectron spectroscopy measurements indicated that the amount of cross-linking in the films increased with increasing substrate temperature. Corresponding to the change in the molecular structure, the adhesion strength of the films to the Si substrate, estimated by micro-scratch testing, improved with increasing substrate temperature. |
| 書誌情報 |
en : Vacuum
巻 87,
p. 218-221,
発行日 2013-01
|
| DOI |
|
|
|
識別子タイプ |
DOI |
|
|
関連識別子 |
https://doi.org/10.1016/j.vacuum.2012.05.029 |
| 権利 |
|
|
権利情報 |
c 2012 Elsevier |
| 出版者 |
|
|
出版者 |
Elsevier |
| 著者版フラグ |
|
|
言語 |
en |
|
値 |
author |
| 出版タイプ |
|
|
出版タイプ |
AM |
|
出版タイプResource |
http://purl.org/coar/version/c_ab4af688f83e57aa |
No_8_Vacuum_87_218.pdf (2.2 MB)
