{"created":"2021-03-01T06:00:49.266942+00:00","id":8469,"links":{},"metadata":{"_buckets":{"deposit":"744d6a29-e3d0-4005-b963-96eff0b980da"},"_deposit":{"id":"8469","owners":[],"pid":{"revision_id":0,"type":"depid","value":"8469"},"status":"published"},"_oai":{"id":"oai:kitami-it.repo.nii.ac.jp:00008469","sets":["1:87"]},"author_link":["44879","44880","44650","44651","44652","44653"],"item_1646810750418":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_3_biblio_info_186":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2013-01","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"221","bibliographicPageStart":"218","bibliographicVolumeNumber":"87","bibliographic_titles":[{"bibliographic_title":"Vacuum","bibliographic_titleLang":"en"}]}]},"item_3_description_184":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Fluorocarbon thin films were formed by radio-frequency magnetron sputtering using a polytetrafluoroethylene target with different substrate temperatures in the range −5 to 200 °C. Using X-ray diffraction and Fourier transform infrared spectroscopy, it was confirmed that the films were amorphous and contained C–F bonds. X-ray photoelectron spectroscopy measurements indicated that the amount of cross-linking in the films increased with increasing substrate temperature. Corresponding to the change in the molecular structure, the adhesion strength of the films to the Si substrate, estimated by micro-scratch testing, improved with increasing substrate temperature.","subitem_description_type":"Abstract"}]},"item_3_full_name_183":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{"nameIdentifier":"44879","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"20261399","nameIdentifierScheme":"KAKEN","nameIdentifierURI":"https://nrid.nii.ac.jp/ja/nrid/1000020261399 "}],"names":[{"name":"阿部, 良夫","nameLang":"ja"}]},{"nameIdentifiers":[{"nameIdentifier":"44880","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"70261401","nameIdentifierScheme":"KAKEN","nameIdentifierURI":"https://nrid.nii.ac.jp/ja/nrid/1000070261401 "}],"names":[{"name":"川村, みどり","nameLang":"ja"}]}]},"item_3_publisher_212":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"Elsevier"}]},"item_3_relation_191":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"https://doi.org/10.1016/j.vacuum.2012.05.029","subitem_relation_type_select":"DOI"}}]},"item_3_rights_192":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"c 2012 Elsevier"}]},"item_3_select_195":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_select_item":"author"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Suzuki, Yuta","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Fu, Haojie","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Abe, Yoshio","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kawamura, Midori","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2017-01-12"}],"displaytype":"detail","filename":"No_8_Vacuum_87_218.pdf","filesize":[{"value":"2.2 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"No_8_Vacuum_87_218.pdf","url":"https://kitami-it.repo.nii.ac.jp/record/8469/files/No_8_Vacuum_87_218.pdf"},"version_id":"734c3c4d-1d03-4aa9-8192-ac2dded18c01"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Rf sputtering","subitem_subject_scheme":"Other"},{"subitem_subject":"Thin film","subitem_subject_scheme":"Other"},{"subitem_subject":"PTFE","subitem_subject_scheme":"Other"},{"subitem_subject":"Fluorocarbon","subitem_subject_scheme":"Other"},{"subitem_subject":"Adhesion strength","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Effects of substrate temperature on structure and mechanical properties of sputter deposited fluorocarbon thin films","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Effects of substrate temperature on structure and mechanical properties of sputter deposited fluorocarbon thin films","subitem_title_language":"en"}]},"item_type_id":"3","owner":"1","path":["87"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2016-09-08"},"publish_date":"2016-09-08","publish_status":"0","recid":"8469","relation_version_is_last":true,"title":["Effects of substrate temperature on structure and mechanical properties of sputter deposited fluorocarbon thin films"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2022-12-13T02:22:48.973191+00:00"}