@article{oai:kitami-it.repo.nii.ac.jp:00008469,
 author = {Suzuki, Yuta and Fu, Haojie and Abe, Yoshio and Kawamura, Midori},
 journal = {Vacuum},
 month = {Jan},
 note = {Fluorocarbon thin films were formed by radio-frequency magnetron sputtering using a polytetrafluoroethylene target with different substrate temperatures in the range −5 to 200 °C. Using X-ray diffraction and Fourier transform infrared spectroscopy, it was confirmed that the films were amorphous and contained C–F bonds. X-ray photoelectron spectroscopy measurements indicated that the amount of cross-linking in the films increased with increasing substrate temperature. Corresponding to the change in the molecular structure, the adhesion strength of the films to the Si substrate, estimated by micro-scratch testing, improved with increasing substrate temperature.},
 pages = {218--221},
 title = {Effects of substrate temperature on structure and mechanical properties of sputter deposited fluorocarbon thin films},
 volume = {87},
 year = {2013}
}