{"_buckets": {"deposit": "e7b1123d-8550-4af9-9bdf-1b35b10c0b55"}, "_deposit": {"id": "8468", "owners": [], "pid": {"revision_id": 0, "type": "depid", "value": "8468"}, "status": "published"}, "_oai": {"id": "oai:kitami-it.repo.nii.ac.jp:00008468", "sets": ["1:86"]}, "author_link": ["44879", "44880", "44643", "44644", "44645", "44646", "44647"], "item_1646810750418": {"attribute_name": "\u51fa\u7248\u30bf\u30a4\u30d7", "attribute_value_mlt": [{"subitem_version_resource": "http://purl.org/coar/version/c_ab4af688f83e57aa", "subitem_version_type": "AM"}]}, "item_3_biblio_info_186": {"attribute_name": "\u66f8\u8a8c\u60c5\u5831", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2008", "bibliographicIssueDateType": "Issued"}, "bibliographicIssueNumber": "3", "bibliographicPageEnd": "530", "bibliographicPageStart": "528", "bibliographicVolumeNumber": "83", "bibliographic_titles": [{"bibliographic_title": "Vacuum"}]}]}, "item_3_description_184": {"attribute_name": "\u6284\u9332", "attribute_value_mlt": [{"subitem_description": "Hydrogen-containing Ta2O5 (Ta2O5:H) thin films are considered to be a candidate for a proton-conducting solid-oxide electrolyte. In this study, Ta2O5:H thin films were prepared by reactively sputtering a Ta metal target in an O2 + H2O mixed gas. The effects of sputtering power and post-deposition heat treatment on the ion conducting properties of the Ta2O5:H thin films were studied. The ionic conductivity of the films was improved by decreasing the RF power and a maximum conductivity of 2 \u00d7 10?9 S/cm was obtained at an RF power of 20 W. The ionic conductivity decreased by heat-treatment in air, and no ion-conduction was observed after treatment at 300 \u00b0C due to the decrease in hydrogen content in the films.", "subitem_description_type": "Abstract"}]}, "item_3_full_name_183": {"attribute_name": "\u8457\u8005\u5225\u540d", "attribute_value_mlt": [{"nameIdentifiers": [{"nameIdentifier": "44879", "nameIdentifierScheme": "WEKO"}, {"nameIdentifier": "20261399", "nameIdentifierScheme": "KAKEN", "nameIdentifierURI": "https://nrid.nii.ac.jp/ja/nrid/1000020261399 "}], "names": [{"name": "\u963f\u90e8, \u826f\u592b", "nameLang": "ja"}]}, {"nameIdentifiers": [{"nameIdentifier": "44880", "nameIdentifierScheme": "WEKO"}, {"nameIdentifier": "70261401", "nameIdentifierScheme": "KAKEN", "nameIdentifierURI": "https://nrid.nii.ac.jp/ja/nrid/1000070261401 "}], "names": [{"name": "\u5ddd\u6751, \u307f\u3069\u308a", "nameLang": "ja"}]}]}, "item_3_publisher_212": {"attribute_name": "\u51fa\u7248\u8005", "attribute_value_mlt": [{"subitem_publisher": "Elsevier"}]}, "item_3_relation_191": {"attribute_name": "DOI", "attribute_value_mlt": [{"subitem_relation_type_id": {"subitem_relation_type_id_text": "https://doi.org/10.1016/j.vacuum.2008.04.018", "subitem_relation_type_select": "DOI"}}]}, "item_3_rights_192": {"attribute_name": "\u6a29\u5229", "attribute_value_mlt": [{"subitem_rights": "c 2008 Elsevier"}]}, "item_3_select_195": {"attribute_name": "\u8457\u8005\u7248\u30d5\u30e9\u30b0", "attribute_value_mlt": [{"subitem_select_item": "author"}]}, "item_3_subject_196": {"attribute_name": "\u65e5\u672c\u5341\u9032\u5206\u985e\u6cd5", "attribute_value_mlt": [{"subitem_subject": "420", "subitem_subject_scheme": "NDC"}]}, "item_access_right": {"attribute_name": "\u30a2\u30af\u30bb\u30b9\u6a29", "attribute_value_mlt": [{"subitem_access_right": "open access", "subitem_access_right_uri": "http://purl.org/coar/access_right/c_abf2"}]}, "item_creator": {"attribute_name": "\u8457\u8005", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "Abe, Yoshio", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "44643", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Itadani, Naruhiro", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "44644", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Kawamura, Midori", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "44645", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Sasaki, Katsutaka", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "44646", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Itoh, Hidenobu", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "44647", "nameIdentifierScheme": "WEKO"}]}]}, "item_files": {"attribute_name": "\u30d5\u30a1\u30a4\u30eb\u60c5\u5831", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2017-01-12"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "No_5_Vaccum_83_528.pdf", "filesize": [{"value": "858.7 kB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensetype": "license_note", "mimetype": "application/pdf", "size": 858700.0, "url": {"label": "No_5_Vaccum_83_528.pdf", "url": "https://kitami-it.repo.nii.ac.jp/record/8468/files/No_5_Vaccum_83_528.pdf"}, "version_id": "11b3061d-804c-41e6-bc2d-55ddcc28f831"}]}, "item_keyword": {"attribute_name": "\u30ad\u30fc\u30ef\u30fc\u30c9", "attribute_value_mlt": [{"subitem_subject": "Proton-conducting solid electrolyte thin film", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Tantalum oxide", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Reactive sputtering", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Ionic conductivity", "subitem_subject_scheme": "Other"}]}, "item_language": {"attribute_name": "\u8a00\u8a9e", "attribute_value_mlt": [{"subitem_language": "eng"}]}, "item_resource_type": {"attribute_name": "\u8cc7\u6e90\u30bf\u30a4\u30d7", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "Ion conducting properties of hydrogen-containing Ta2O5 thin films prepared by reactive sputtering", "item_titles": {"attribute_name": "\u30bf\u30a4\u30c8\u30eb", "attribute_value_mlt": [{"subitem_title": "Ion conducting properties of hydrogen-containing Ta2O5 thin films prepared by reactive sputtering", "subitem_title_language": "en"}]}, "item_type_id": "3", "owner": "1", "path": ["1/86"], "permalink_uri": "https://kitami-it.repo.nii.ac.jp/records/8468", "pubdate": {"attribute_name": "PubDate", "attribute_value": "2016-09-08"}, "publish_date": "2016-09-08", "publish_status": "0", "recid": "8468", "relation": {}, "relation_version_is_last": true, "title": ["Ion conducting properties of hydrogen-containing Ta2O5 thin films prepared by reactive sputtering"], "weko_shared_id": -1}