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Ion conducting properties of hydrogen-containing Ta2O5 thin films prepared by reactive sputtering
https://kitami-it.repo.nii.ac.jp/records/8468
https://kitami-it.repo.nii.ac.jp/records/8468250c1920-b720-47f1-8422-e82aaa974057
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
No_5_Vaccum_83_528.pdf (858.7 kB)
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| Item type | 学術雑誌論文 / Journal Article(1) | |||||||||||||||
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| 公開日 | 2016-09-08 | |||||||||||||||
| タイトル | ||||||||||||||||
| タイトル | Ion conducting properties of hydrogen-containing Ta2O5 thin films prepared by reactive sputtering | |||||||||||||||
| 言語 | en | |||||||||||||||
| 言語 | ||||||||||||||||
| 言語 | eng | |||||||||||||||
| キーワード | ||||||||||||||||
| 主題Scheme | Other | |||||||||||||||
| 主題 | Proton-conducting solid electrolyte thin film | |||||||||||||||
| キーワード | ||||||||||||||||
| 主題Scheme | Other | |||||||||||||||
| 主題 | Tantalum oxide | |||||||||||||||
| キーワード | ||||||||||||||||
| 主題Scheme | Other | |||||||||||||||
| 主題 | Reactive sputtering | |||||||||||||||
| キーワード | ||||||||||||||||
| 主題Scheme | Other | |||||||||||||||
| 主題 | Ionic conductivity | |||||||||||||||
| 資源タイプ | ||||||||||||||||
| 資源 | http://purl.org/coar/resource_type/c_6501 | |||||||||||||||
| タイプ | journal article | |||||||||||||||
| アクセス権 | ||||||||||||||||
| アクセス権 | open access | |||||||||||||||
| アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||||||||||||
| 著者 |
Abe, Yoshio
× Abe, Yoshio
× Itadani, Naruhiro
× Kawamura, Midori
× Sasaki, Katsutaka
× Itoh, Hidenobu
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| 著者別名 | ||||||||||||||||
| 識別子Scheme | WEKO | |||||||||||||||
| 識別子 | 44879 | |||||||||||||||
| 識別子Scheme | KAKEN | |||||||||||||||
| 識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000020261399 | |||||||||||||||
| 識別子 | 20261399 | |||||||||||||||
| 姓名 | 阿部, 良夫 | |||||||||||||||
| 言語 | ja | |||||||||||||||
| 著者別名 | ||||||||||||||||
| 識別子Scheme | WEKO | |||||||||||||||
| 識別子 | 44880 | |||||||||||||||
| 識別子Scheme | KAKEN | |||||||||||||||
| 識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000070261401 | |||||||||||||||
| 識別子 | 70261401 | |||||||||||||||
| 姓名 | 川村, みどり | |||||||||||||||
| 言語 | ja | |||||||||||||||
| 抄録 | ||||||||||||||||
| 内容記述タイプ | Abstract | |||||||||||||||
| 内容記述 | Hydrogen-containing Ta2O5 (Ta2O5:H) thin films are considered to be a candidate for a proton-conducting solid-oxide electrolyte. In this study, Ta2O5:H thin films were prepared by reactively sputtering a Ta metal target in an O2 + H2O mixed gas. The effects of sputtering power and post-deposition heat treatment on the ion conducting properties of the Ta2O5:H thin films were studied. The ionic conductivity of the films was improved by decreasing the RF power and a maximum conductivity of 2 × 10?9 S/cm was obtained at an RF power of 20 W. The ionic conductivity decreased by heat-treatment in air, and no ion-conduction was observed after treatment at 300 °C due to the decrease in hydrogen content in the films. | |||||||||||||||
| 書誌情報 |
Vacuum 巻 83, 号 3, p. 528-530, 発行日 2008 |
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| DOI | ||||||||||||||||
| 識別子タイプ | DOI | |||||||||||||||
| 関連識別子 | https://doi.org/10.1016/j.vacuum.2008.04.018 | |||||||||||||||
| 権利 | ||||||||||||||||
| 権利情報 | c 2008 Elsevier | |||||||||||||||
| 出版者 | ||||||||||||||||
| 出版者 | Elsevier | |||||||||||||||
| 著者版フラグ | ||||||||||||||||
| 言語 | en | |||||||||||||||
| 値 | author | |||||||||||||||
| 出版タイプ | ||||||||||||||||
| 出版タイプ | AM | |||||||||||||||
| 出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||||||||||||
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Cite as
Abe, Yoshio, Itadani, Naruhiro, Kawamura, Midori, Sasaki, Katsutaka, Itoh, Hidenobu, 2008, Ion conducting properties of hydrogen-containing Ta2O5 thin films prepared by reactive sputtering: Elsevier, 528–530 p.
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