{"_buckets": {"deposit": "31d22df8-32f1-46de-af65-8bb1c60cd775"}, "_deposit": {"id": "7615", "owners": [], "pid": {"revision_id": 0, "type": "depid", "value": "7615"}, "status": "published"}, "_oai": {"id": "oai:kitami-it.repo.nii.ac.jp:00007615", "sets": ["87"]}, "author_link": ["39014", "39015", "39016", "39017", "39018"], "item_1646810750418": {"attribute_name": "出版タイプ", "attribute_value_mlt": [{"subitem_version_resource": "http://purl.org/coar/version/c_ab4af688f83e57aa", "subitem_version_type": "AM"}]}, "item_3_biblio_info_186": {"attribute_name": "書誌情報", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2010-06", "bibliographicIssueDateType": "Issued"}, "bibliographicIssueNumber": "12", "bibliographicPageEnd": "1367", "bibliographicPageStart": "1365", "bibliographicVolumeNumber": "84", "bibliographic_titles": [{"bibliographic_title": "Vacuum"}]}]}, "item_3_description_184": {"attribute_name": "抄録", "attribute_value_mlt": [{"subitem_description": "Reactive sputtering techniques have been widely used for forming compound thin films. In this study, the time-dependent variation of the target mode of an Al-O_2 system was investigated by measuring the target voltage for various reactive O_2 gas flow ratios and presputtering (i.e., sputtering in pure Ar gas to clean the target surface) times. The Al target remains in metallic mode for a certain period of time after being exposed to an Ar-O_2 plasma before it begins to be oxidized. This period increases with decreasing O_2 flow ratio and with increasing the presputtering time. It is considered that the period is caused by the gettering of O_2 gas by Al films deposited on the substrate and the chamber wall during presputtering.", "subitem_description_type": "Abstract"}, {"subitem_description": "target surface state", "subitem_description_type": "Abstract"}]}, "item_3_publisher_212": {"attribute_name": "出版者", "attribute_value_mlt": [{"subitem_publisher": "Elsevier"}]}, "item_3_select_195": {"attribute_name": "著者版フラグ", "attribute_value_mlt": [{"subitem_select_item": "author"}]}, "item_access_right": {"attribute_name": "アクセス権", "attribute_value_mlt": [{"subitem_access_right": "open access", "subitem_access_right_uri": "http://purl.org/coar/access_right/c_abf2"}]}, "item_creator": {"attribute_name": "著者", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "Abe, Yoshio", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "39014", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Shinya, Koji", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "39015", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Chiba, Youjiro", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "39016", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Kawamura, Midori", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "39017", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Sasaki, Katsutaka", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "39018", "nameIdentifierScheme": "WEKO"}]}]}, "item_files": {"attribute_name": "ファイル情報", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2016-11-22"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "No277.pdf", "filesize": [{"value": "267.0 kB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensetype": "license_note", "mimetype": "application/pdf", "size": 267000.0, "url": {"label": "No277.pdf", "url": "https://kitami-it.repo.nii.ac.jp/record/7615/files/No277.pdf"}, "version_id": "8de7e515-5647-4d72-bfc5-8dbf7be977e5"}]}, "item_keyword": {"attribute_name": "キーワード", "attribute_value_mlt": [{"subitem_subject": "gettering effect", "subitem_subject_scheme": "Other"}, {"subitem_subject": "target voltage", "subitem_subject_scheme": "Other"}, {"subitem_subject": "chamber pressure", "subitem_subject_scheme": "Other"}]}, "item_language": {"attribute_name": "言語", "attribute_value_mlt": [{"subitem_language": "eng"}]}, "item_resource_type": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "Time-dependent variation of the target mode in reactive sputtering of Al-O_2 system", "item_titles": {"attribute_name": "タイトル", "attribute_value_mlt": [{"subitem_title": "Time-dependent variation of the target mode in reactive sputtering of Al-O_2 system", "subitem_title_language": "en"}]}, "item_type_id": "3", "owner": "1", "path": ["87"], "permalink_uri": "https://kitami-it.repo.nii.ac.jp/records/7615", "pubdate": {"attribute_name": "PubDate", "attribute_value": "2014-02-25"}, "publish_date": "2014-02-25", "publish_status": "0", "recid": "7615", "relation": {}, "relation_version_is_last": true, "title": ["Time-dependent variation of the target mode in reactive sputtering of Al-O_2 system"], "weko_shared_id": -1}