{"created":"2021-03-01T06:00:04.091422+00:00","id":7615,"links":{},"metadata":{"_buckets":{"deposit":"31d22df8-32f1-46de-af65-8bb1c60cd775"},"_deposit":{"id":"7615","owners":[],"pid":{"revision_id":0,"type":"depid","value":"7615"},"status":"published"},"_oai":{"id":"oai:kitami-it.repo.nii.ac.jp:00007615","sets":["1:87"]},"author_link":["39014","39015","39016","39017","39018"],"item_1646810750418":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_3_biblio_info_186":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2010-06","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"12","bibliographicPageEnd":"1367","bibliographicPageStart":"1365","bibliographicVolumeNumber":"84","bibliographic_titles":[{"bibliographic_title":"Vacuum"}]}]},"item_3_description_184":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Reactive sputtering techniques have been widely used for forming compound thin films. In this study, the time-dependent variation of the target mode of an Al-O_2 system was investigated by measuring the target voltage for various reactive O_2 gas flow ratios and presputtering (i.e., sputtering in pure Ar gas to clean the target surface) times. The Al target remains in metallic mode for a certain period of time after being exposed to an Ar-O_2 plasma before it begins to be oxidized. This period increases with decreasing O_2 flow ratio and with increasing the presputtering time. It is considered that the period is caused by the gettering of O_2 gas by Al films deposited on the substrate and the chamber wall during presputtering.","subitem_description_type":"Abstract"},{"subitem_description":"target surface state","subitem_description_type":"Abstract"}]},"item_3_publisher_212":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"Elsevier"}]},"item_3_select_195":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_select_item":"author"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Abe, Yoshio","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Shinya, Koji","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Chiba, Youjiro","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kawamura, Midori","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Sasaki, Katsutaka","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2016-11-22"}],"displaytype":"detail","filename":"No277.pdf","filesize":[{"value":"267.0 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"No277.pdf","url":"https://kitami-it.repo.nii.ac.jp/record/7615/files/No277.pdf"},"version_id":"8de7e515-5647-4d72-bfc5-8dbf7be977e5"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"gettering effect","subitem_subject_scheme":"Other"},{"subitem_subject":"target voltage","subitem_subject_scheme":"Other"},{"subitem_subject":"chamber pressure","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Time-dependent variation of the target mode in reactive sputtering of Al-O_2 system","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Time-dependent variation of the target mode in reactive sputtering of Al-O_2 system","subitem_title_language":"en"}]},"item_type_id":"3","owner":"1","path":["87"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2014-02-25"},"publish_date":"2014-02-25","publish_status":"0","recid":"7615","relation_version_is_last":true,"title":["Time-dependent variation of the target mode in reactive sputtering of Al-O_2 system"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2022-12-13T02:21:04.090635+00:00"}