{"_buckets": {"deposit": "73e35ec9-64e1-4707-b8d3-90a86f8b4df0"}, "_deposit": {"id": "6970", "owners": [], "pid": {"revision_id": 0, "type": "depid", "value": "6970"}, "status": "published"}, "_oai": {"id": "oai:kitami-it.repo.nii.ac.jp:00006970"}, "item_3_biblio_info_186": {"attribute_name": "\u66f8\u8a8c\u60c5\u5831", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2005-11", "bibliographicIssueDateType": "Issued"}, "bibliographicPageEnd": "211901-3", "bibliographicPageStart": "211901-1", "bibliographicVolumeNumber": "87", "bibliographic_titles": [{"bibliographic_title": "Applied physics letters"}]}]}, "item_3_description_184": {"attribute_name": "\u6284\u9332", "attribute_value_mlt": [{"subitem_description": "Nanoindentation tests were performed on a ductile-machined silicon wafer with a Berkovich\u3000diamond indenter, and the resulting indents were examined with a transmission electron microscope. It was found that the machining-induced subsurface amorphous layer undergoes significant plastic flow\uff0c and the microstructure of the indent depends on the indentation load. At a small load (\uff5e20 mN)\uff0cmost of the indented region remains to be amorphous with minor crystalline nuclei; while under a large load (\uff5e50 mN)\uff0cthe amorphous phase undergoes intensive recrystallization. The understanding and utilization of this phenomenon might be useful for improving the microscopic surface properties of silicon parts produced by a ductile machining process.", "subitem_description_type": "Abstract"}]}, "item_3_publisher_212": {"attribute_name": "\u51fa\u7248\u8005", "attribute_value_mlt": [{"subitem_publisher": "American Institute of Physics"}]}, "item_3_relation_191": {"attribute_name": "DOI", "attribute_value_mlt": [{"subitem_relation_type_id": {"subitem_relation_type_id_text": "http://doi.org/10.1063/1.2133908", "subitem_relation_type_select": "DOI"}}]}, "item_3_rights_192": {"attribute_name": "\u6a29\u5229", "attribute_value_mlt": [{"subitem_rights": "The following article appeared in C.C. Hsu, J.H. Lin, T.H. Huang, K. Harada, Applied Physics Letters, 87, 211901-1-211901-3, (2005) and may be found at http://link.aip.org/link/?apl/87/211901-1."}, {"subitem_rights": "Copyright 2005 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics."}]}, "item_3_select_195": {"attribute_name": "\u8457\u8005\u7248\u30d5\u30e9\u30b0", "attribute_value_mlt": [{"subitem_select_item": "publisher"}]}, "item_3_subject_196": {"attribute_name": "\u65e5\u672c\u5341\u9032\u5206\u985e\u6cd5", "attribute_value_mlt": [{"subitem_subject": "541.65", "subitem_subject_scheme": "NDC"}]}, "item_creator": {"attribute_name": "\u8457\u8005", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "Yan, Jiwang"}], "nameIdentifiers": [{"nameIdentifier": "35204", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Takahashi, Hirokazu"}], "nameIdentifiers": [{"nameIdentifier": "35205", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Tamaki, Jun-ichi"}], "nameIdentifiers": [{"nameIdentifier": "35206", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Gai, Xiaohui"}], "nameIdentifiers": [{"nameIdentifier": "35207", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Kuriyagawa, Tsunemoto"}], "nameIdentifiers": [{"nameIdentifier": "35208", "nameIdentifierScheme": "WEKO"}]}]}, "item_files": {"attribute_name": "\u30d5\u30a1\u30a4\u30eb\u60c5\u5831", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2016-11-22"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "4102.pdf", "filesize": [{"value": "4.1 MB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensetype": "license_free", "mimetype": "application/pdf", "size": 4099999.9999999995, "url": {"label": "4102.pdf", "url": "https://kitami-it.repo.nii.ac.jp/record/6970/files/4102.pdf"}, "version_id": "a888fb88-29f3-4e9b-b151-78b8767fa83d"}]}, "item_language": {"attribute_name": "\u8a00\u8a9e", "attribute_value_mlt": [{"subitem_language": "eng"}]}, "item_resource_type": {"attribute_name": "\u8cc7\u6e90\u30bf\u30a4\u30d7", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "Transmission electron microscopic observation of nanoindentations made on ductile-machined silicon wafers", "item_titles": {"attribute_name": "\u30bf\u30a4\u30c8\u30eb", "attribute_value_mlt": [{"subitem_title": "Transmission electron microscopic observation of nanoindentations made on ductile-machined silicon wafers"}]}, "item_type_id": "3", "owner": "1", "path": ["1"], "permalink_uri": "https://kitami-it.repo.nii.ac.jp/records/6970", "pubdate": {"attribute_name": "\u516c\u958b\u65e5", "attribute_value": "2007-05-08"}, "publish_date": "2007-05-08", "publish_status": "0", "recid": "6970", "relation": {}, "relation_version_is_last": true, "title": ["Transmission electron microscopic observation of nanoindentations made on ductile-machined silicon wafers"], "weko_shared_id": 3}