| Item type |
学術雑誌論文 / Journal Article(1) |
| 公開日 |
2016-09-08 |
| タイトル |
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タイトル |
Effect of Heat Treatment on Ion Conductivity of Hydrated ZrO2 Thin Films Prepared by Reactive Sputtering Using H2O Gas |
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言語 |
en |
| 言語 |
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|
言語 |
eng |
| 資源タイプ |
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資源 |
http://purl.org/coar/resource_type/c_6501 |
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タイプ |
journal article |
| アクセス権 |
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アクセス権 |
open access |
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アクセス権URI |
http://purl.org/coar/access_right/c_abf2 |
| 著者 |
Li, Ning
Abe, Yoshio
Kawamura, Midori
Sasaki, Katsutaka
Itoh, Hidenobu
Suzuki, Tsutomu
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| 抄録 |
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内容記述タイプ |
Abstract |
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内容記述 |
Hydrated ZrO2 thin films were prepared by reactive sputtering using H2O gas, and these films were heat treated in air at temperatures from 100 to 350 °C. Absorbance peaks due to hydrogen-bonded OH groups for these samples were observed by Fourier transform infrared spectroscopy. The peak intensities were nearly the same before and after heat treatment below 200 °C, but began to decrease at 250 °C, and the absorption peak disappeared at 350 °C. Ion conductivity of the films was evaluated by AC impedance measurements and was found to be about 3 ×10-6 S/m before and after heat treatment at 200 °C; it also decreased after heat treatment above 250 °C. From these results, we considered that protons of OH and/or H2O in the films are the dominant ionic species that contribute to the ion conductivity of the films. |
| 書誌情報 |
Japanese Journal of Applied Physics
巻 50,
号 4R,
p. 045804,
発行日 2011
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| 権利 |
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権利情報 |
c 2011 The Japan Society of Applied Physics |
| 出版者 |
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出版者 |
The Japan Society of Applied Physics |
| 著者版フラグ |
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言語 |
en |
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値 |
author |
| 出版タイプ |
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出版タイプ |
AM |
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出版タイプResource |
http://purl.org/coar/version/c_ab4af688f83e57aa |
No_39_JJAP_50_045804.pdf (1.9 MB)
