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Effect of Heat Treatment on Ion Conductivity of Hydrated ZrO2 Thin Films Prepared by Reactive Sputtering Using H2O Gas
https://kitami-it.repo.nii.ac.jp/records/8474
https://kitami-it.repo.nii.ac.jp/records/847451a8c0cf-b28a-42f0-95b1-5512f55e14ea
名前 / ファイル | ライセンス | アクション |
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Item type | 学術雑誌論文 / Journal Article(1) | |||||||||||||||||
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公開日 | 2016-09-08 | |||||||||||||||||
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タイトル | Effect of Heat Treatment on Ion Conductivity of Hydrated ZrO2 Thin Films Prepared by Reactive Sputtering Using H2O Gas | |||||||||||||||||
言語 | en | |||||||||||||||||
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言語 | eng | |||||||||||||||||
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資源 | http://purl.org/coar/resource_type/c_6501 | |||||||||||||||||
タイプ | journal article | |||||||||||||||||
アクセス権 | ||||||||||||||||||
アクセス権 | open access | |||||||||||||||||
アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||||||||||||||
著者 |
Li, Ning
× Li, Ning
× Abe, Yoshio
× Kawamura, Midori
× Sasaki, Katsutaka
× Itoh, Hidenobu
× Suzuki, Tsutomu
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識別子Scheme | WEKO | |||||||||||||||||
識別子 | 44879 | |||||||||||||||||
識別子Scheme | KAKEN | |||||||||||||||||
識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000020261399 | |||||||||||||||||
識別子 | 20261399 | |||||||||||||||||
姓名 | 阿部, 良夫 | |||||||||||||||||
言語 | ja | |||||||||||||||||
著者別名 | ||||||||||||||||||
識別子Scheme | WEKO | |||||||||||||||||
識別子 | 44880 | |||||||||||||||||
識別子Scheme | KAKEN | |||||||||||||||||
識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000070261401 | |||||||||||||||||
識別子 | 70261401 | |||||||||||||||||
姓名 | 川村, みどり | |||||||||||||||||
言語 | ja | |||||||||||||||||
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内容記述タイプ | Abstract | |||||||||||||||||
内容記述 | Hydrated ZrO2 thin films were prepared by reactive sputtering using H2O gas, and these films were heat treated in air at temperatures from 100 to 350 °C. Absorbance peaks due to hydrogen-bonded OH groups for these samples were observed by Fourier transform infrared spectroscopy. The peak intensities were nearly the same before and after heat treatment below 200 °C, but began to decrease at 250 °C, and the absorption peak disappeared at 350 °C. Ion conductivity of the films was evaluated by AC impedance measurements and was found to be about 3 ×10-6 S/m before and after heat treatment at 200 °C; it also decreased after heat treatment above 250 °C. From these results, we considered that protons of OH and/or H2O in the films are the dominant ionic species that contribute to the ion conductivity of the films. | |||||||||||||||||
書誌情報 |
Japanese Journal of Applied Physics 巻 50, 号 4R, p. 045804, 発行日 2011 |
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権利 | ||||||||||||||||||
権利情報 | c 2011 The Japan Society of Applied Physics | |||||||||||||||||
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出版者 | The Japan Society of Applied Physics | |||||||||||||||||
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言語 | en | |||||||||||||||||
値 | author | |||||||||||||||||
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出版タイプ | AM | |||||||||||||||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa |
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Li, Ning, Abe, Yoshio, Kawamura, Midori, Sasaki, Katsutaka, Itoh, Hidenobu, Suzuki, Tsutomu, 2011, Effect of Heat Treatment on Ion Conductivity of Hydrated ZrO2 Thin Films Prepared by Reactive Sputtering Using H2O Gas: The Japan Society of Applied Physics, 045804– p.
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