{"created":"2021-03-01T06:00:49.566065+00:00","id":8474,"links":{},"metadata":{"_buckets":{"deposit":"ae59874e-df2b-424a-8635-0b99d362bb25"},"_deposit":{"id":"8474","owners":[],"pid":{"revision_id":0,"type":"depid","value":"8474"},"status":"published"},"_oai":{"id":"oai:kitami-it.repo.nii.ac.jp:00008474","sets":["1:87"]},"author_link":["44879","44880","44685","44686","44687","44688","44689","44690"],"item_1646810750418":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_3_biblio_info_186":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2011","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"4R","bibliographicPageStart":"045804","bibliographicVolumeNumber":"50","bibliographic_titles":[{"bibliographic_title":"Japanese Journal of Applied Physics"}]}]},"item_3_description_184":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Hydrated ZrO2 thin films were prepared by reactive sputtering using H2O gas, and these films were heat treated in air at temperatures from 100 to 350 °C. Absorbance peaks due to hydrogen-bonded OH groups for these samples were observed by Fourier transform infrared spectroscopy. The peak intensities were nearly the same before and after heat treatment below 200 °C, but began to decrease at 250 °C, and the absorption peak disappeared at 350 °C. Ion conductivity of the films was evaluated by AC impedance measurements and was found to be about 3 ×10-6 S/m before and after heat treatment at 200 °C; it also decreased after heat treatment above 250 °C. From these results, we considered that protons of OH and/or H2O in the films are the dominant ionic species that contribute to the ion conductivity of the films.","subitem_description_type":"Abstract"}]},"item_3_full_name_183":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{"nameIdentifier":"44879","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"20261399","nameIdentifierScheme":"KAKEN","nameIdentifierURI":"https://nrid.nii.ac.jp/ja/nrid/1000020261399 "}],"names":[{"name":"阿部, 良夫","nameLang":"ja"}]},{"nameIdentifiers":[{"nameIdentifier":"44880","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"70261401","nameIdentifierScheme":"KAKEN","nameIdentifierURI":"https://nrid.nii.ac.jp/ja/nrid/1000070261401 "}],"names":[{"name":"川村, みどり","nameLang":"ja"}]}]},"item_3_publisher_212":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"The Japan Society of Applied Physics"}]},"item_3_rights_192":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"c 2011 The Japan Society of Applied Physics"}]},"item_3_select_195":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_select_item":"author"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Li, Ning","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"44685","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Abe, Yoshio","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"44686","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Kawamura, Midori","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"44687","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Sasaki, Katsutaka","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"44688","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Itoh, Hidenobu","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"44689","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Suzuki, Tsutomu","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"44690","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2017-01-12"}],"displaytype":"detail","filename":"No_39_JJAP_50_045804.pdf","filesize":[{"value":"1.9 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"No_39_JJAP_50_045804.pdf","url":"https://kitami-it.repo.nii.ac.jp/record/8474/files/No_39_JJAP_50_045804.pdf"},"version_id":"1b255c2c-28b6-4777-9993-df9c70b92825"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Effect of Heat Treatment on Ion Conductivity of Hydrated ZrO2 Thin Films Prepared by Reactive Sputtering Using H2O Gas","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Effect of Heat Treatment on Ion Conductivity of Hydrated ZrO2 Thin Films Prepared by Reactive Sputtering Using H2O Gas","subitem_title_language":"en"}]},"item_type_id":"3","owner":"1","path":["87"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2016-09-08"},"publish_date":"2016-09-08","publish_status":"0","recid":"8474","relation_version_is_last":true,"title":["Effect of Heat Treatment on Ion Conductivity of Hydrated ZrO2 Thin Films Prepared by Reactive Sputtering Using H2O Gas"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2024-06-03T02:12:08.419100+00:00"}