| Item type |
学術雑誌論文 / Journal Article(1) |
| 公開日 |
2016-09-08 |
| タイトル |
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タイトル |
Effects of Substrate Temperature on Electrochromic Properties of Cobalt Oxide and Oxyhydroxide Thin Films Prepared by Reactive Sputtering Using O2 and H2O Gases |
|
言語 |
en |
| 言語 |
|
|
言語 |
eng |
| 資源タイプ |
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資源 |
http://purl.org/coar/resource_type/c_6501 |
|
タイプ |
journal article |
| アクセス権 |
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アクセス権 |
open access |
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アクセス権URI |
http://purl.org/coar/access_right/c_abf2 |
| 著者 |
Lee, KyoungMoo
Abe, Yoshio
Kawamura, Midori
Kim, Kyung Ho
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| 抄録 |
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内容記述タイプ |
Abstract |
|
内容記述 |
Cobalt oxide and oxyhydroxide thin films were prepared by reactive sputtering of a Co target in O2 and H2O gases at substrate temperatures from -20 to +200 °C. Co3O4 films were formed at all the substrate temperatures in O2 gas and at 200 °C in H2O gas, and amorphous CoOOH films were formed in the range from 10 to -20 °C in H2O gas. A large transmittance change of approximately 26% and high electrochromic (EC) coloration efficiency of 20 cm2/C at a wavelength of 600 nm were obtained for the CoOOH thin films deposited at -20 °C in 0.1 M KOH aqueous solution. The good EC performance of the CoOOH film is attributed to the low film density and amorphous structure. |
| 書誌情報 |
en : Japanese Journal of Applied Physics
巻 51,
号 4R,
p. 045501,
発行日 2012
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| 権利 |
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|
権利情報 |
c 2012 The Japan Society of Applied Physics |
| 出版者 |
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出版者 |
The Japan Society of Applied Physics |
| 著者版フラグ |
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|
言語 |
en |
|
値 |
author |
| 出版タイプ |
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出版タイプ |
AM |
|
出版タイプResource |
http://purl.org/coar/version/c_ab4af688f83e57aa |
No_33_JJAP_51_045501.pdf (1.2 MB)
