WEKO3
-
RootNode
アイテム
Effects of Substrate Temperature on Electrochromic Properties of Cobalt Oxide and Oxyhydroxide Thin Films Prepared by Reactive Sputtering Using O2 and H2O Gases
https://kitami-it.repo.nii.ac.jp/records/8473
https://kitami-it.repo.nii.ac.jp/records/847365846f72-bb0a-4187-b82c-df3c8f35f267
名前 / ファイル | ライセンス | アクション |
---|---|---|
![]() |
|
Item type | 学術雑誌論文 / Journal Article(1) | |||||||||||||
---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
公開日 | 2016-09-08 | |||||||||||||
タイトル | ||||||||||||||
タイトル | Effects of Substrate Temperature on Electrochromic Properties of Cobalt Oxide and Oxyhydroxide Thin Films Prepared by Reactive Sputtering Using O2 and H2O Gases | |||||||||||||
言語 | en | |||||||||||||
言語 | ||||||||||||||
言語 | eng | |||||||||||||
資源タイプ | ||||||||||||||
資源 | http://purl.org/coar/resource_type/c_6501 | |||||||||||||
タイプ | journal article | |||||||||||||
アクセス権 | ||||||||||||||
アクセス権 | open access | |||||||||||||
アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||||||||||
著者 |
Lee, KyoungMoo
× Lee, KyoungMoo
× Abe, Yoshio
× Kawamura, Midori
× Kim, Kyung Ho
|
|||||||||||||
著者別名 | ||||||||||||||
識別子Scheme | WEKO | |||||||||||||
識別子 | 44879 | |||||||||||||
識別子Scheme | KAKEN | |||||||||||||
識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000020261399 | |||||||||||||
識別子 | 20261399 | |||||||||||||
姓名 | 阿部, 良夫 | |||||||||||||
言語 | ja | |||||||||||||
著者別名 | ||||||||||||||
識別子Scheme | WEKO | |||||||||||||
識別子 | 44880 | |||||||||||||
識別子Scheme | KAKEN | |||||||||||||
識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000070261401 | |||||||||||||
識別子 | 70261401 | |||||||||||||
姓名 | 川村, みどり | |||||||||||||
言語 | ja | |||||||||||||
著者別名 | ||||||||||||||
識別子Scheme | WEKO | |||||||||||||
識別子 | 44878 | |||||||||||||
識別子Scheme | KAKEN | |||||||||||||
識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000070608471 | |||||||||||||
識別子 | 70608471 | |||||||||||||
姓名 | 金, 敬鎬 | |||||||||||||
言語 | ja | |||||||||||||
抄録 | ||||||||||||||
内容記述タイプ | Abstract | |||||||||||||
内容記述 | Cobalt oxide and oxyhydroxide thin films were prepared by reactive sputtering of a Co target in O2 and H2O gases at substrate temperatures from -20 to +200 °C. Co3O4 films were formed at all the substrate temperatures in O2 gas and at 200 °C in H2O gas, and amorphous CoOOH films were formed in the range from 10 to -20 °C in H2O gas. A large transmittance change of approximately 26% and high electrochromic (EC) coloration efficiency of 20 cm2/C at a wavelength of 600 nm were obtained for the CoOOH thin films deposited at -20 °C in 0.1 M KOH aqueous solution. The good EC performance of the CoOOH film is attributed to the low film density and amorphous structure. | |||||||||||||
書誌情報 |
en : Japanese Journal of Applied Physics 巻 51, 号 4R, p. 045501, 発行日 2012 |
|||||||||||||
権利 | ||||||||||||||
権利情報 | c 2012 The Japan Society of Applied Physics | |||||||||||||
出版者 | ||||||||||||||
出版者 | The Japan Society of Applied Physics | |||||||||||||
著者版フラグ | ||||||||||||||
言語 | en | |||||||||||||
値 | author | |||||||||||||
出版タイプ | ||||||||||||||
出版タイプ | AM | |||||||||||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa |
Share
Cite as
Lee, KyoungMoo, Abe, Yoshio, Kawamura, Midori, Kim, Kyung Ho, 2012, Effects of Substrate Temperature on Electrochromic Properties of Cobalt Oxide and Oxyhydroxide Thin Films Prepared by Reactive Sputtering Using O2 and H2O Gases: The Japan Society of Applied Physics, 045501– p.
Loading...