{"created":"2021-03-01T06:00:49.506648+00:00","id":8473,"links":{},"metadata":{"_buckets":{"deposit":"62d5568b-fb29-49ab-acb8-e0bc04170c3a"},"_deposit":{"id":"8473","owners":[],"pid":{"revision_id":0,"type":"depid","value":"8473"},"status":"published"},"_oai":{"id":"oai:kitami-it.repo.nii.ac.jp:00008473","sets":["1:87"]},"author_link":["44879","44880","44878","44678","44679","44680","44681"],"item_1646810750418":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_3_biblio_info_186":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2012","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"4R","bibliographicPageStart":"045501","bibliographicVolumeNumber":"51","bibliographic_titles":[{"bibliographic_title":"Japanese Journal of Applied Physics","bibliographic_titleLang":"en"}]}]},"item_3_description_184":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Cobalt oxide and oxyhydroxide thin films were prepared by reactive sputtering of a Co target in O2 and H2O gases at substrate temperatures from -20 to +200 °C. Co3O4 films were formed at all the substrate temperatures in O2 gas and at 200 °C in H2O gas, and amorphous CoOOH films were formed in the range from 10 to -20 °C in H2O gas. A large transmittance change of approximately 26% and high electrochromic (EC) coloration efficiency of 20 cm2/C at a wavelength of 600 nm were obtained for the CoOOH thin films deposited at -20 °C in 0.1 M KOH aqueous solution. The good EC performance of the CoOOH film is attributed to the low film density and amorphous structure.","subitem_description_type":"Abstract"}]},"item_3_full_name_183":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{"nameIdentifier":"44879","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"20261399","nameIdentifierScheme":"KAKEN","nameIdentifierURI":"https://nrid.nii.ac.jp/ja/nrid/1000020261399 "}],"names":[{"name":"阿部, 良夫","nameLang":"ja"}]},{"nameIdentifiers":[{"nameIdentifier":"44880","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"70261401","nameIdentifierScheme":"KAKEN","nameIdentifierURI":"https://nrid.nii.ac.jp/ja/nrid/1000070261401 "}],"names":[{"name":"川村, みどり","nameLang":"ja"}]},{"nameIdentifiers":[{"nameIdentifier":"44878","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"70608471","nameIdentifierScheme":"KAKEN","nameIdentifierURI":"https://nrid.nii.ac.jp/ja/nrid/1000070608471 "}],"names":[{"name":"金, 敬鎬","nameLang":"ja"}]}]},"item_3_publisher_212":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"The Japan Society of Applied Physics"}]},"item_3_rights_192":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"c 2012 The Japan Society of Applied Physics"}]},"item_3_select_195":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_select_item":"author"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Lee, KyoungMoo","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Abe, Yoshio","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kawamura, Midori","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kim, Kyung Ho","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2017-01-12"}],"displaytype":"detail","filename":"No_33_JJAP_51_045501.pdf","filesize":[{"value":"1.2 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"No_33_JJAP_51_045501.pdf","url":"https://kitami-it.repo.nii.ac.jp/record/8473/files/No_33_JJAP_51_045501.pdf"},"version_id":"6a136202-2f56-4e88-80a3-ac46060da6d9"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Effects of Substrate Temperature on Electrochromic Properties of Cobalt Oxide and Oxyhydroxide Thin Films Prepared by Reactive Sputtering Using O2 and H2O Gases","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Effects of Substrate Temperature on Electrochromic Properties of Cobalt Oxide and Oxyhydroxide Thin Films Prepared by Reactive Sputtering Using O2 and H2O Gases","subitem_title_language":"en"}]},"item_type_id":"3","owner":"1","path":["87"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2016-09-08"},"publish_date":"2016-09-08","publish_status":"0","recid":"8473","relation_version_is_last":true,"title":["Effects of Substrate Temperature on Electrochromic Properties of Cobalt Oxide and Oxyhydroxide Thin Films Prepared by Reactive Sputtering Using O2 and H2O Gases"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2022-12-13T02:21:58.685820+00:00"}