| Item type |
学術雑誌論文 / Journal Article(1) |
| 公開日 |
2016-09-08 |
| タイトル |
|
|
タイトル |
Target-Surface Compound Layers Formed by Reactive Sputtering of Si Target in Ar+O2 and Ar+N2 Mixed Gases |
|
言語 |
en |
| 言語 |
|
|
言語 |
eng |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
reactive sputtering |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
Si model target |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
plasma oxidation and nitridation |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
ellipsometry |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
target surface state |
| 資源タイプ |
|
|
資源 |
http://purl.org/coar/resource_type/c_6501 |
|
タイプ |
journal article |
| アクセス権 |
|
|
アクセス権 |
open access |
|
アクセス権URI |
http://purl.org/coar/access_right/c_abf2 |
| 著者 |
Abe, Yoshio
Takisawa, Takaya
Kawamura, Midori
Sasaki, Katsutaka
|
| 著者別名 |
|
|
|
識別子Scheme |
WEKO |
|
|
識別子 |
44879 |
|
|
識別子Scheme |
KAKEN |
|
|
識別子URI |
https://nrid.nii.ac.jp/ja/nrid/1000020261399 |
|
|
識別子 |
20261399 |
|
|
姓名 |
阿部, 良夫 |
|
|
言語 |
ja |
| 著者別名 |
|
|
|
識別子Scheme |
WEKO |
|
|
識別子 |
44880 |
|
|
識別子Scheme |
KAKEN - 研究者検索 |
|
|
識別子URI |
https://nrid.nii.ac.jp/ja/nrid/1000070261401 |
|
|
識別子 |
70261401 |
|
|
姓名 |
川村, みどり |
|
|
言語 |
ja |
|
|
姓 |
川村 |
|
|
言語 |
ja |
|
|
名 |
みどり |
|
|
言語 |
ja |
|
|
|
識別子Scheme |
ISNI |
|
|
|
識別子URI |
https://www.isni.org/isni/ |
| 抄録 |
|
|
内容記述タイプ |
Abstract |
|
内容記述 |
Reactive sputtering is a very useful and widely used technique for preparing compound thin films, however, the target surface state is not fully understood. In this study, a Si wafer was used as a model sputtering target, and the thickness of the oxide and nitride layers formed on the target surface after sputtering in Ar+O2 and Ar+N2 mixed gases, respectively, was measured by ellipsometry. The maximum thicknesses of oxide and nitride layers were found to be approximately 7 nm in pure O2 gas and 4 nm in pure N2 gas, respectively. The oxidation rate of Si in oxygen plasma was thought to be higher than the nitridation rate of Si in nitrogen plasma. |
| 書誌情報 |
Japanese Journal of Applied Physics
巻 46,
号 10A,
p. 6778-6781,
発行日 2007
|
| 権利 |
|
|
権利情報 |
c 2007 The Japan Society of Applied Physics |
| 出版者 |
|
|
出版者 |
The Japan Society of Applied Physics |
| 著者版フラグ |
|
|
言語 |
en |
|
値 |
author |
| 出版タイプ |
|
|
出版タイプ |
AM |
|
出版タイプResource |
http://purl.org/coar/version/c_ab4af688f83e57aa |
No_28_JJAP_46_6778.pdf (250.5 kB)
