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Target-Surface Compound Layers Formed by Reactive Sputtering of Si Target in Ar+O2 and Ar+N2 Mixed Gases
https://kitami-it.repo.nii.ac.jp/records/8472
https://kitami-it.repo.nii.ac.jp/records/847286f76898-cfa2-4fe7-b04c-e43c5fa7b9ae
名前 / ファイル | ライセンス | アクション |
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No_28_JJAP_46_6778.pdf (250.5 kB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2016-09-08 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Target-Surface Compound Layers Formed by Reactive Sputtering of Si Target in Ar+O2 and Ar+N2 Mixed Gases | |||||
言語 | ||||||
言語 | eng | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | reactive sputtering | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Si model target | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | plasma oxidation and nitridation | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | ellipsometry | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | target surface state | |||||
資源タイプ | ||||||
資源 | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | journal article | |||||
アクセス権 | ||||||
アクセス権 | open access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
著者 |
Abe, Yoshio
× Abe, Yoshio× Takisawa, Takaya× Kawamura, Midori× Sasaki, Katsutaka |
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著者別名 | ||||||
姓名 | 阿部, 良夫 | |||||
言語 | ja | |||||
著者別名 | ||||||
姓名 | 川村, みどり | |||||
言語 | ja | |||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | Reactive sputtering is a very useful and widely used technique for preparing compound thin films, however, the target surface state is not fully understood. In this study, a Si wafer was used as a model sputtering target, and the thickness of the oxide and nitride layers formed on the target surface after sputtering in Ar+O2 and Ar+N2 mixed gases, respectively, was measured by ellipsometry. The maximum thicknesses of oxide and nitride layers were found to be approximately 7 nm in pure O2 gas and 4 nm in pure N2 gas, respectively. The oxidation rate of Si in oxygen plasma was thought to be higher than the nitridation rate of Si in nitrogen plasma. | |||||
書誌情報 |
Japanese Journal of Applied Physics 巻 46, 号 10A, p. 6778-6781, 発行日 2007 |
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権利 | ||||||
権利情報 | c 2007 The Japan Society of Applied Physics | |||||
出版者 | ||||||
出版者 | The Japan Society of Applied Physics | |||||
著者版フラグ | ||||||
値 | author | |||||
出版タイプ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa |