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Effects of the Ar-N_2 Sputtering Gas Mixture on the Preferential Orientation of sputtered Ru Films
https://kitami-it.repo.nii.ac.jp/records/6905
https://kitami-it.repo.nii.ac.jp/records/690581927600-475a-4652-8dab-f273b45d906e
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
4638.pdf (175.7 kB)
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| Item type | 学術雑誌論文 / Journal Article(1) | |||||||||||||
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| 公開日 | 2007-04-19 | |||||||||||||
| タイトル | ||||||||||||||
| タイトル | Effects of the Ar-N_2 Sputtering Gas Mixture on the Preferential Orientation of sputtered Ru Films | |||||||||||||
| 言語 | en | |||||||||||||
| 言語 | ||||||||||||||
| 言語 | eng | |||||||||||||
| 資源タイプ | ||||||||||||||
| 資源 | http://purl.org/coar/resource_type/c_6501 | |||||||||||||
| タイプ | journal article | |||||||||||||
| アクセス権 | ||||||||||||||
| アクセス権 | open access | |||||||||||||
| アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||||||||||
| 著者 |
Kawamura, Midori
× Kawamura, Midori
× Yagi, Kenji
× Abe, Yoshio
× Sasaki, Katsutaka
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| 著者別名 | ||||||||||||||
| 識別子Scheme | WEKO | |||||||||||||
| 識別子 | 44880 | |||||||||||||
| 識別子Scheme | KAKEN | |||||||||||||
| 識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000070261401 | |||||||||||||
| 識別子 | 70261401 | |||||||||||||
| 姓名 | 川村, みどり | |||||||||||||
| 言語 | ja | |||||||||||||
| 著者別名 | ||||||||||||||
| 識別子Scheme | WEKO | |||||||||||||
| 識別子 | 44879 | |||||||||||||
| 識別子Scheme | KAKEN | |||||||||||||
| 識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000020261399 | |||||||||||||
| 識別子 | 20261399 | |||||||||||||
| 姓名 | 阿部, 良夫 | |||||||||||||
| 言語 | ja | |||||||||||||
| 著者別名 | ||||||||||||||
| 識別子Scheme | WEKO | |||||||||||||
| 識別子 | 34937 | |||||||||||||
| 姓名 | 佐々木, 克孝 | |||||||||||||
| 言語 | ja | |||||||||||||
| 抄録 | ||||||||||||||
| 内容記述タイプ | Abstract | |||||||||||||
| 内容記述 | We have investigated the influence of N_2 addition to the Ar sputtering gas on the crystal orientation of sputtered Ru films. An rf magnetron sputtering apparatus with a Ru target (99.9%) and a glass substrate heated to 100°C or 300°C was used for the deposition. The crystal structure, chemical composition and electrical properties of the resultant films were investigated. X-ray diffraction (XRD) revealed the dominant orientation at 0% N_2 to be the c-axis. With increasing proportion of N_2 in the sputtering gas at a substrate temperature of 100°C, the intensity of the (002) peak decreased, finally disappearing at 50% N_2. This c-axis suppressed Ru film sputtered at 50% N_2 was found to contain nitrogen by Auger electron spectroscopy (AES), but by annealing the film in vacuum at 400°C, the nitrogen in the film was completely removed. The film orientation remained the same as before annealing. Thus, we have demonstrated a new method for depositing Ru films with a controlled preferential orientation of either c-axis oriented or c-axis suppressed. | |||||||||||||
| 書誌情報 |
Thin Solid Films 巻 494, 号 1-2, p. 240-243, 発行日 2006-01 |
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| DOI | ||||||||||||||
| 識別子タイプ | DOI | |||||||||||||
| 関連識別子 | http://doi.org/10.1016/j.tsf.2005.08.130 | |||||||||||||
| 権利 | ||||||||||||||
| 権利情報 | http://www.sciencedirect.com/science/journal/00406090 | |||||||||||||
| 権利 | ||||||||||||||
| 権利情報 | Elsevier B.V., Midori Kawamura, Kenji Yagi, Yoshio Abe and Katsutaka Sasaki, Thin Solid Films, 494(1-2), 2006, 240-243. | |||||||||||||
| フォーマット | ||||||||||||||
| 内容記述タイプ | Other | |||||||||||||
| 内容記述 | application/pdf | |||||||||||||
| 出版者 | ||||||||||||||
| 出版者 | Elsevier | |||||||||||||
| 言語 | en | |||||||||||||
| 著者版フラグ | ||||||||||||||
| 言語 | en | |||||||||||||
| 値 | author | |||||||||||||
| 出版タイプ | ||||||||||||||
| 出版タイプ | AM | |||||||||||||
| 出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||||||||||
