{"created":"2021-03-01T05:59:20.912440+00:00","id":6905,"links":{},"metadata":{"_buckets":{"deposit":"ae4065eb-f922-4406-8280-ebe089c86ea3"},"_deposit":{"id":"6905","owners":[],"pid":{"revision_id":0,"type":"depid","value":"6905"},"status":"published"},"_oai":{"id":"oai:kitami-it.repo.nii.ac.jp:00006905","sets":["1:87"]},"author_link":["44880","44879","34937","34931","34932","34933","34934"],"item_1646810750418":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_3_biblio_info_186":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2006-01","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"1-2","bibliographicPageEnd":"243","bibliographicPageStart":"240","bibliographicVolumeNumber":"494","bibliographic_titles":[{"bibliographic_title":"Thin Solid Films"}]}]},"item_3_description_184":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"We have investigated the influence of N_2 addition to the Ar sputtering gas on the crystal orientation of sputtered Ru films. An rf magnetron sputtering apparatus with a Ru target (99.9%) and a glass substrate heated to 100°C or 300°C was used for the deposition. The crystal structure, chemical composition and electrical properties of the resultant films were investigated. X-ray diffraction (XRD) revealed the dominant orientation at 0% N_2 to be the c-axis. With increasing proportion of N_2 in the sputtering gas at a substrate temperature of 100°C, the intensity of the (002) peak decreased, finally disappearing at 50% N_2. This c-axis suppressed Ru film sputtered at 50% N_2 was found to contain nitrogen by Auger electron spectroscopy (AES), but by annealing the film in vacuum at 400°C, the nitrogen in the film was completely removed. The film orientation remained the same as before annealing. Thus, we have demonstrated a new method for depositing Ru films with a controlled preferential orientation of either c-axis oriented or c-axis suppressed.","subitem_description_type":"Abstract"}]},"item_3_description_194":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_3_full_name_183":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{"nameIdentifier":"44880","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"70261401","nameIdentifierScheme":"KAKEN","nameIdentifierURI":"https://nrid.nii.ac.jp/ja/nrid/1000070261401 "}],"names":[{"name":"川村, みどり","nameLang":"ja"}]},{"nameIdentifiers":[{"nameIdentifier":"44879","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"20261399","nameIdentifierScheme":"KAKEN","nameIdentifierURI":"https://nrid.nii.ac.jp/ja/nrid/1000020261399 "}],"names":[{"name":"阿部, 良夫","nameLang":"ja"}]},{"nameIdentifiers":[{"nameIdentifier":"34937","nameIdentifierScheme":"WEKO"}],"names":[{"name":"佐々木, 克孝","nameLang":"ja"}]}]},"item_3_publisher_212":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"Elsevier"}]},"item_3_relation_191":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://doi.org/10.1016/j.tsf.2005.08.130","subitem_relation_type_select":"DOI"}}]},"item_3_rights_192":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"http://www.sciencedirect.com/science/journal/00406090"},{"subitem_rights":"Elsevier B.V., Midori Kawamura, Kenji Yagi, Yoshio Abe and Katsutaka Sasaki, Thin Solid Films, 494(1-2), 2006, 240-243."}]},"item_3_select_195":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_select_item":"author"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Kawamura, Midori","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Yagi, Kenji","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Abe, Yoshio","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Sasaki, Katsutaka","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2016-11-22"}],"displaytype":"detail","filename":"4638.pdf","filesize":[{"value":"175.7 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"4638.pdf","url":"https://kitami-it.repo.nii.ac.jp/record/6905/files/4638.pdf"},"version_id":"431148ee-d7e6-4efb-b30f-f04e500c73c6"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Effects of the Ar-N_2 Sputtering Gas Mixture on the Preferential Orientation of sputtered Ru Films","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Effects of the Ar-N_2 Sputtering Gas Mixture on the Preferential Orientation of sputtered Ru Films","subitem_title_language":"en"}]},"item_type_id":"3","owner":"1","path":["87"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2007-04-19"},"publish_date":"2007-04-19","publish_status":"0","recid":"6905","relation_version_is_last":true,"title":["Effects of the Ar-N_2 Sputtering Gas Mixture on the Preferential Orientation of sputtered Ru Films"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2022-12-13T02:19:51.019545+00:00"}