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Effects of thermal treatment on structure and electrical properties of sputtered Ir-W alloy thin films
https://kitami-it.repo.nii.ac.jp/records/6900
https://kitami-it.repo.nii.ac.jp/records/69006f378bee-9a10-4a59-85f0-10c9c3a45b4f
名前 / ファイル | ライセンス | アクション |
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2007-04-19 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Effects of thermal treatment on structure and electrical properties of sputtered Ir-W alloy thin films | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源 | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | journal article | |||||
アクセス権 | ||||||
アクセス権 | open access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
著者 |
Abe, Yoshio
× Abe, Yoshio× Watanabe, Eiji× Sasaki, Katsutaka× Iura, Shigemi |
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著者別名 | ||||||
姓名 | 阿部, 良夫 | |||||
言語 | ja | |||||
著者別名 | ||||||
姓名 | 佐々木, 克孝 | |||||
言語 | ja | |||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | Thermally and chemically stable electrode films are required for capacitor electrodes of semiconductor memories, such as dynamic random access memories (DRAMs) and ferroelectric random access memories (FeRAMs). In this study, iridium-tungsten (Ir-W) alloy thin films were prepared on SiO_2/Si substrates by RF magnetron sputtering, and the effects of thermal treatment in oxygen atmosphere on the structural and electrical properties of the films were studied. The surface of the as-deposited Ir-W films was very smooth and the films showed low electrical resistivities below 120 μΩcm. The resistances and the smooth surface morphology of the Ir-W (approximately 20 at.%) films remained after thermal treatment up to 600°C in oxygen, which indicates the high thermal stability of the Ir-W alloy thin films. | |||||
書誌情報 |
Surface and Coatings Technology 巻 198, 号 1-3, p. 148-151, 発行日 2005-08 |
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DOI | ||||||
識別子タイプ | DOI | |||||
関連識別子 | http://doi.org/10.1016/j.surfcoat.2004.10.037 | |||||
権利 | ||||||
権利情報 | http://www.sciencedirect.com/science/journal/02578972 | |||||
権利 | ||||||
権利情報 | Elsevier B.V., Yoshio Abe, Eiji Watanabe, Katsutaka Sasaki and Shigemi Iura, Surface and Coatings Technology, 198(1-3), 2005, 148-151. | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf | |||||
出版者 | ||||||
出版者 | Elsevier | |||||
著者版フラグ | ||||||
値 | author | |||||
出版タイプ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa |