{"created":"2021-03-01T05:59:20.608877+00:00","id":6900,"links":{},"metadata":{"_buckets":{"deposit":"50de5a26-d49e-4099-a534-40ef59f9ddbd"},"_deposit":{"id":"6900","owners":[],"pid":{"revision_id":0,"type":"depid","value":"6900"},"status":"published"},"_oai":{"id":"oai:kitami-it.repo.nii.ac.jp:00006900","sets":["1:87"]},"author_link":["44879","34903","34898","34899","34900","34901"],"item_1646810750418":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_3_biblio_info_186":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2005-08","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"1-3","bibliographicPageEnd":"151","bibliographicPageStart":"148","bibliographicVolumeNumber":"198","bibliographic_titles":[{"bibliographic_title":"Surface and Coatings Technology"}]}]},"item_3_description_184":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Thermally and chemically stable electrode films are required for capacitor electrodes of semiconductor memories, such as dynamic random access memories (DRAMs) and ferroelectric random access memories (FeRAMs). In this study, iridium-tungsten (Ir-W) alloy thin films were prepared on SiO_2/Si substrates by RF magnetron sputtering, and the effects of thermal treatment in oxygen atmosphere on the structural and electrical properties of the films were studied. The surface of the as-deposited Ir-W films was very smooth and the films showed low electrical resistivities below 120 μΩcm. The resistances and the smooth surface morphology of the Ir-W (approximately 20 at.%) films remained after thermal treatment up to 600°C in oxygen, which indicates the high thermal stability of the Ir-W alloy thin films.","subitem_description_type":"Abstract"}]},"item_3_description_194":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_3_full_name_183":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{"nameIdentifier":"44879","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"20261399","nameIdentifierScheme":"KAKEN","nameIdentifierURI":"https://nrid.nii.ac.jp/ja/nrid/1000020261399 "}],"names":[{"name":"阿部, 良夫","nameLang":"ja"}]},{"nameIdentifiers":[{"nameIdentifier":"34903","nameIdentifierScheme":"WEKO"}],"names":[{"name":"佐々木, 克孝","nameLang":"ja"}]}]},"item_3_publisher_212":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"Elsevier"}]},"item_3_relation_191":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://doi.org/10.1016/j.surfcoat.2004.10.037","subitem_relation_type_select":"DOI"}}]},"item_3_rights_192":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"http://www.sciencedirect.com/science/journal/02578972"},{"subitem_rights":"Elsevier B.V., Yoshio Abe, Eiji Watanabe, Katsutaka Sasaki and Shigemi Iura, Surface and Coatings Technology, 198(1-3), 2005, 148-151."}]},"item_3_select_195":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_select_item":"author"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Abe, Yoshio","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Watanabe, Eiji","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Sasaki, Katsutaka","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Iura, Shigemi","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2016-11-22"}],"displaytype":"detail","filename":"4604.pdf","filesize":[{"value":"352.1 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"4604.pdf","url":"https://kitami-it.repo.nii.ac.jp/record/6900/files/4604.pdf"},"version_id":"98261159-0bc1-42af-809f-005d50e1caee"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Effects of thermal treatment on structure and electrical properties of sputtered Ir-W alloy thin films","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Effects of thermal treatment on structure and electrical properties of sputtered Ir-W alloy thin films","subitem_title_language":"en"}]},"item_type_id":"3","owner":"1","path":["87"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2007-04-19"},"publish_date":"2007-04-19","publish_status":"0","recid":"6900","relation_version_is_last":true,"title":["Effects of thermal treatment on structure and electrical properties of sputtered Ir-W alloy thin films"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2022-12-13T02:24:54.495018+00:00"}