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Characterization of Ag oxide thin films prepared by reactive RF sputtering
https://kitami-it.repo.nii.ac.jp/records/6898
https://kitami-it.repo.nii.ac.jp/records/6898f7ca1369-c2f5-4369-b253-799b7397b178
名前 / ファイル | ライセンス | アクション |
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2007-04-19 | |||||
タイトル | ||||||
タイトル | Characterization of Ag oxide thin films prepared by reactive RF sputtering | |||||
言語 | en | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
アクセス権 | ||||||
アクセス権 | open access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
著者 |
Abe, Yoshio
× Abe, Yoshio× Hasegawa, Tomoaki× Kawamura, Midori× Sasaki, Katsutaka |
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著者別名 | ||||||
識別子Scheme | WEKO | |||||
識別子 | 44879 | |||||
識別子Scheme | KAKEN | |||||
識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000020261399 | |||||
識別子 | 20261399 | |||||
姓名 | 阿部, 良夫 | |||||
言語 | ja | |||||
著者別名 | ||||||
識別子Scheme | WEKO | |||||
識別子 | 44880 | |||||
識別子Scheme | KAKEN | |||||
識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000070261401 | |||||
識別子 | 70261401 | |||||
姓名 | 川村, みどり | |||||
言語 | ja | |||||
著者別名 | ||||||
識別子Scheme | WEKO | |||||
識別子 | 34891 | |||||
姓名 | 佐々木, 克孝 | |||||
言語 | ja | |||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | Ag oxide thin films were grown on glass substrates by sputtering an Ag target in an Ar+O_2 mixed gas. Effects of O_2 flow ratio on resistivity, reflectance and transmittance of the Ag oxide films were studied. Crystal structure and chemical binding state of the films were characterized by X-ray diffraction, X-ray photoelectron spectroscopy, and scanning electron microscopy. Ag films with a resistivity of 4 μΩcm and a reflectance of 98% were obtained at O_2 flow ratios below 5%. The increase of resistivity and the decrease of reflectance were observed with increasing O_2 flow ratio due to the formation of mixed films of Ag and Ag oxide. Above an O_2 flow ratio of 40%, the transmittance of the films increased and semitransparent Ag_2O films with resistivity of an order of 10^8Ωcm were formed. | |||||
書誌情報 |
Vacuum 巻 76, 号 1, p. 1-6, 発行日 2004-10 |
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DOI | ||||||
識別子タイプ | DOI | |||||
関連識別子 | http://doi.org/10.1016/j.vacuum.2004.05.003 | |||||
権利 | ||||||
権利情報 | http://www.sciencedirect.com/science/journal/0042207X | |||||
権利 | ||||||
権利情報 | Elsevier Ltd., Yoshio Abe, Tomoaki Hasegawa, Midori Kawamura and Katsutaka Sasaki, Vacuum, 76(1), 2004, 1-6. | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf | |||||
出版者 | ||||||
出版者 | Elsevier | |||||
言語 | en | |||||
著者版フラグ | ||||||
言語 | en | |||||
値 | author | |||||
出版タイプ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa |