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Characterization of Ag oxide thin films prepared by reactive RF sputtering
https://kitami-it.repo.nii.ac.jp/records/6898
https://kitami-it.repo.nii.ac.jp/records/6898f7ca1369-c2f5-4369-b253-799b7397b178
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
4656.pdf (701.9 kB)
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| Item type | 学術雑誌論文 / Journal Article(1) | |||||||||||||
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| 公開日 | 2007-04-19 | |||||||||||||
| タイトル | ||||||||||||||
| タイトル | Characterization of Ag oxide thin films prepared by reactive RF sputtering | |||||||||||||
| 言語 | en | |||||||||||||
| 言語 | ||||||||||||||
| 言語 | eng | |||||||||||||
| 資源タイプ | ||||||||||||||
| 資源 | http://purl.org/coar/resource_type/c_6501 | |||||||||||||
| タイプ | journal article | |||||||||||||
| アクセス権 | ||||||||||||||
| アクセス権 | open access | |||||||||||||
| アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||||||||||
| 著者 |
Abe, Yoshio
× Abe, Yoshio
× Hasegawa, Tomoaki
× Kawamura, Midori
× Sasaki, Katsutaka
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| 著者別名 | ||||||||||||||
| 識別子Scheme | WEKO | |||||||||||||
| 識別子 | 44879 | |||||||||||||
| 識別子Scheme | KAKEN | |||||||||||||
| 識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000020261399 | |||||||||||||
| 識別子 | 20261399 | |||||||||||||
| 姓名 | 阿部, 良夫 | |||||||||||||
| 言語 | ja | |||||||||||||
| 著者別名 | ||||||||||||||
| 識別子Scheme | WEKO | |||||||||||||
| 識別子 | 44880 | |||||||||||||
| 識別子Scheme | KAKEN | |||||||||||||
| 識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000070261401 | |||||||||||||
| 識別子 | 70261401 | |||||||||||||
| 姓名 | 川村, みどり | |||||||||||||
| 言語 | ja | |||||||||||||
| 著者別名 | ||||||||||||||
| 識別子Scheme | WEKO | |||||||||||||
| 識別子 | 34891 | |||||||||||||
| 姓名 | 佐々木, 克孝 | |||||||||||||
| 言語 | ja | |||||||||||||
| 抄録 | ||||||||||||||
| 内容記述タイプ | Abstract | |||||||||||||
| 内容記述 | Ag oxide thin films were grown on glass substrates by sputtering an Ag target in an Ar+O_2 mixed gas. Effects of O_2 flow ratio on resistivity, reflectance and transmittance of the Ag oxide films were studied. Crystal structure and chemical binding state of the films were characterized by X-ray diffraction, X-ray photoelectron spectroscopy, and scanning electron microscopy. Ag films with a resistivity of 4 μΩcm and a reflectance of 98% were obtained at O_2 flow ratios below 5%. The increase of resistivity and the decrease of reflectance were observed with increasing O_2 flow ratio due to the formation of mixed films of Ag and Ag oxide. Above an O_2 flow ratio of 40%, the transmittance of the films increased and semitransparent Ag_2O films with resistivity of an order of 10^8Ωcm were formed. | |||||||||||||
| 書誌情報 |
Vacuum 巻 76, 号 1, p. 1-6, 発行日 2004-10 |
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| DOI | ||||||||||||||
| 識別子タイプ | DOI | |||||||||||||
| 関連識別子 | http://doi.org/10.1016/j.vacuum.2004.05.003 | |||||||||||||
| 権利 | ||||||||||||||
| 権利情報 | http://www.sciencedirect.com/science/journal/0042207X | |||||||||||||
| 権利 | ||||||||||||||
| 権利情報 | Elsevier Ltd., Yoshio Abe, Tomoaki Hasegawa, Midori Kawamura and Katsutaka Sasaki, Vacuum, 76(1), 2004, 1-6. | |||||||||||||
| フォーマット | ||||||||||||||
| 内容記述タイプ | Other | |||||||||||||
| 内容記述 | application/pdf | |||||||||||||
| 出版者 | ||||||||||||||
| 出版者 | Elsevier | |||||||||||||
| 言語 | en | |||||||||||||
| 著者版フラグ | ||||||||||||||
| 言語 | en | |||||||||||||
| 値 | author | |||||||||||||
| 出版タイプ | ||||||||||||||
| 出版タイプ | AM | |||||||||||||
| 出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||||||||||
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Abe, Yoshio, Hasegawa, Tomoaki, Kawamura, Midori, Sasaki, Katsutaka, 2004, Characterization of Ag oxide thin films prepared by reactive RF sputtering: Elsevier, 1–6 p.
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