| Item type |
学術雑誌論文 / Journal Article(1) |
| 公開日 |
2007-04-19 |
| タイトル |
|
|
タイトル |
Characterization of Ag oxide thin films prepared by reactive RF sputtering |
|
言語 |
en |
| 言語 |
|
|
言語 |
eng |
| 資源タイプ |
|
|
資源 |
http://purl.org/coar/resource_type/c_6501 |
|
タイプ |
journal article |
| アクセス権 |
|
|
アクセス権 |
open access |
|
アクセス権URI |
http://purl.org/coar/access_right/c_abf2 |
| 著者 |
Abe, Yoshio
Hasegawa, Tomoaki
Kawamura, Midori
Sasaki, Katsutaka
|
| 抄録 |
|
|
内容記述タイプ |
Abstract |
|
内容記述 |
Ag oxide thin films were grown on glass substrates by sputtering an Ag target in an Ar+O_2 mixed gas. Effects of O_2 flow ratio on resistivity, reflectance and transmittance of the Ag oxide films were studied. Crystal structure and chemical binding state of the films were characterized by X-ray diffraction, X-ray photoelectron spectroscopy, and scanning electron microscopy. Ag films with a resistivity of 4 μΩcm and a reflectance of 98% were obtained at O_2 flow ratios below 5%. The increase of resistivity and the decrease of reflectance were observed with increasing O_2 flow ratio due to the formation of mixed films of Ag and Ag oxide. Above an O_2 flow ratio of 40%, the transmittance of the films increased and semitransparent Ag_2O films with resistivity of an order of 10^8Ωcm were formed. |
| 書誌情報 |
Vacuum
巻 76,
号 1,
p. 1-6,
発行日 2004-10
|
| DOI |
|
|
|
識別子タイプ |
DOI |
|
|
関連識別子 |
http://doi.org/10.1016/j.vacuum.2004.05.003 |
| 権利 |
|
|
権利情報 |
http://www.sciencedirect.com/science/journal/0042207X |
| 権利 |
|
|
権利情報 |
Elsevier Ltd., Yoshio Abe, Tomoaki Hasegawa, Midori Kawamura and Katsutaka Sasaki, Vacuum, 76(1), 2004, 1-6. |
| フォーマット |
|
|
内容記述タイプ |
Other |
|
内容記述 |
application/pdf |
| 出版者 |
|
|
出版者 |
Elsevier |
|
言語 |
en |
| 著者版フラグ |
|
|
言語 |
en |
|
値 |
author |
| 出版タイプ |
|
|
出版タイプ |
AM |
|
出版タイプResource |
http://purl.org/coar/version/c_ab4af688f83e57aa |
4656.pdf (701.9 kB)
