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オージエ電子分光分析による合金膜のシリサイド形成初期過程の検討
https://kitami-it.repo.nii.ac.jp/records/6685
https://kitami-it.repo.nii.ac.jp/records/66852759777e-6ca9-45a3-8c28-9b7f0fa8eb02
名前 / ファイル | ライセンス | アクション |
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Item type | 紀要論文 / Departmental Bulletin Paper(1) | |||||
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公開日 | 2007-04-09 | |||||
タイトル | ||||||
タイトル | オージエ電子分光分析による合金膜のシリサイド形成初期過程の検討 | |||||
言語 | ||||||
言語 | jpn | |||||
資源タイプ | ||||||
資源 | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | departmental bulletin paper | |||||
その他のタイトル | ||||||
その他のタイトル | An AES Study on the Initial Processes of Silicide Formation by Alloy Films with Si | |||||
著者 |
武山, 真弓
× 武山, 真弓× 鈴木, 雅英× 野矢, 厚× 佐々木, 克孝 |
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著者別名 | ||||||
識別子 | 33709 | |||||
識別子Scheme | WEKO | |||||
姓名 | Mayumi, TAKEYAMA | |||||
著者別名 | ||||||
識別子 | 33710 | |||||
識別子Scheme | WEKO | |||||
姓名 | Masahide, SUZUKI | |||||
著者別名 | ||||||
識別子 | 33711 | |||||
識別子Scheme | WEKO | |||||
姓名 | Atsushi, NOYA | |||||
著者別名 | ||||||
識別子 | 33712 | |||||
識別子Scheme | WEKO | |||||
姓名 | Katsutaka, SASAKI | |||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | The process of silicide formation by alloy films contacted with Si has been examined on the basis of results obtained from possible combinations of binary alloy films, such as two near-noble metals, near-noble metal and refractory metal,and two refractory metals. It is found that the phase separation of the alloy films due to the silicide formation is observed in the initial stage of the reaction when the following conditions are satisfied ; (i)the alloy film consists of the combination of near-noble metal and refractory metal,which have different reaction process with Si,in the sense that the diffusion species for the reaction of the slicide formation is metal or silicon,and(ii)the alloy doesn't form a stable intermetallic compound | |||||
書誌情報 |
北見工業大学研究報告 巻 24, 号 1, p. 7-15, 発行日 1992-09 |
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フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf | |||||
著者版フラグ | ||||||
値 | publisher | |||||
出版者 | ||||||
出版者 | 北見工業大学 |