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  1. 紀要掲載論文
  2. 北見工業大学研究報告
  3. Vol.24

オージエ電子分光分析による合金膜のシリサイド形成初期過程の検討

https://kitami-it.repo.nii.ac.jp/records/6685
2759777e-6ca9-45a3-8c28-9b7f0fa8eb02
名前 / ファイル ライセンス アクション
24-1-2.pdf 24-1-2.pdf (3.9 MB)
Item type 紀要論文 / Departmental Bulletin Paper(1)
公開日 2007-04-09
タイトル
タイトル オージエ電子分光分析による合金膜のシリサイド形成初期過程の検討
言語
言語 jpn
資源タイプ
資源 http://purl.org/coar/resource_type/c_6501
タイプ departmental bulletin paper
その他のタイトル
その他のタイトル An AES Study on the Initial Processes of Silicide Formation by Alloy Films with Si
著者 武山, 真弓

× 武山, 真弓

WEKO 44855
NRID 1000080236512

武山, 真弓

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鈴木, 雅英

× 鈴木, 雅英

WEKO 33706

鈴木, 雅英

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野矢, 厚

× 野矢, 厚

WEKO 33707

野矢, 厚

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佐々木, 克孝

× 佐々木, 克孝

WEKO 33708

佐々木, 克孝

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著者別名
識別子
識別子 33709
識別子Scheme WEKO
姓名
姓名 Mayumi, TAKEYAMA
著者別名
識別子
識別子 33710
識別子Scheme WEKO
姓名
姓名 Masahide, SUZUKI
著者別名
識別子
識別子 33711
識別子Scheme WEKO
姓名
姓名 Atsushi, NOYA
著者別名
識別子
識別子 33712
識別子Scheme WEKO
姓名
姓名 Katsutaka, SASAKI
抄録
内容記述タイプ Abstract
内容記述 The process of silicide formation by alloy films contacted with Si has been examined on the basis of results obtained from possible combinations of binary alloy films, such as two near-noble metals, near-noble metal and refractory metal,and two refractory metals. It is found that the phase separation of the alloy films due to the silicide formation is observed in the initial stage of the reaction when the following conditions are satisfied ; (i)the alloy film consists of the combination of near-noble metal and refractory metal,which have different reaction process with Si,in the sense that the diffusion species for the reaction of the slicide formation is metal or silicon,and(ii)the alloy doesn't form a stable intermetallic compound
書誌情報 北見工業大学研究報告

巻 24, 号 1, p. 7-15, 発行日 1992-09
フォーマット
内容記述タイプ Other
内容記述 application/pdf
著者版フラグ
値 publisher
出版者
出版者 北見工業大学
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