| Item type |
学術雑誌論文 / Journal Article(1) |
| 公開日 |
2016-09-08 |
| タイトル |
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タイトル |
Formation of hydrated yttrium oxide and titanium oxide thin films by reactive sputtering in H2O atmosphere and their electrical properties |
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言語 |
en |
| 言語 |
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言語 |
eng |
| 資源タイプ |
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資源 |
http://purl.org/coar/resource_type/c_6501 |
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タイプ |
journal article |
| アクセス権 |
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アクセス権URI |
open access |
| 著者 |
Abe, Yoshio
Li, Ning
Nishimoto, Kosuke
Kawamura, Midori
Kim, Kyung Ho
Suzuki, Tsutomu
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| 抄録 |
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内容記述タイプ |
Abstract |
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内容記述 |
Hydrated yttrium oxide and titanium oxide thin films were prepared by reactive sputtering in H2O atmosphere at substrate temperatures from −30 to +130 °C. The electrical conductivities of the yttrium oxide films increased with decreasing substrate temperature. The increase in electrical conductivity corresponds well to the increase in IR absorption intensity due to OH bonds, and it is considered that proton conduction is dominant in the yttrium oxide films. In contrast, the conductivity of the titanium oxide films increased with increasing substrate temperature, suggesting that electron conduction is dominant in the films. |
| 書誌情報 |
Japanese Journal of Applied Physics
巻 53,
号 6,
p. 068002,
発行日 2014
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| 権利 |
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権利情報 |
c 2014 The Japan Society of Applied Physics |
| 出版者 |
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出版者 |
The Japan Society of Applied Physics |
| 著者版フラグ |
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言語 |
en |
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値 |
author |
| 出版タイプ |
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出版タイプ |
AM |
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出版タイプResource |
http://purl.org/coar/version/c_ab4af688f83e57aa |
No_17_JJAP_53_068002.pdf (1.3 MB)
