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Thermally Stable Ag Thin Films Modified with Very Thin Al Oxide Layers
https://kitami-it.repo.nii.ac.jp/records/8466
https://kitami-it.repo.nii.ac.jp/records/8466e1118d6b-bee2-4e36-9c69-0b297b9261b9
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
No.15-Kawamura.pdf (318.1 kB)
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| Item type | 学術雑誌論文 / Journal Article(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2016-09-08 | |||||
| タイトル | ||||||
| タイトル | Thermally Stable Ag Thin Films Modified with Very Thin Al Oxide Layers | |||||
| 言語 | en | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | Ag thin film | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | electrode | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | agglomeration suppression | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | Al oxide layer | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | modification | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | resistivity | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | journal article | |||||
| アクセス権 | ||||||
| アクセス権 | open access | |||||
| アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
| 著者 |
Kawamura, Midori
× Kawamura, Midori× Inami, Yuuki× Abe, Yoshio× Sasaki, Katsutaka |
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| 著者別名 | ||||||
| 識別子Scheme | WEKO | |||||
| 識別子 | 44880 | |||||
| 識別子Scheme | KAKEN | |||||
| 識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000070261401 | |||||
| 識別子 | 70261401 | |||||
| 姓名 | 川村, みどり | |||||
| 言語 | ja | |||||
| 著者別名 | ||||||
| 識別子Scheme | WEKO | |||||
| 識別子 | 44879 | |||||
| 識別子Scheme | KAKEN | |||||
| 識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000020261399 | |||||
| 識別子 | 20261399 | |||||
| 姓名 | 阿部, 良夫 | |||||
| 言語 | ja | |||||
| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | Ag has long been of interest for use as a low-resistivity electrode material, but the problem of agglomeration caused by annealing must be resolved. One of the solutions is alloying Ag, but this often causes an increase in electrical resistivity. In this study, thermal stability of Ag thin films modified with thin Al oxide layers was investigated from the viewpoints of surface morphology and resistivity. It was found that agglomeration was suppressed in the multilayer films even after annealing at 600 °C, similarly to Ag(Al) alloy films, which were investigated previously. As a result, it was suggested that the presence of the Al oxide layers at the film surface and interface played a major role in suppressing agglomeration in Ag(Al) films. Moreover, the resistivity of the multilayer film was 1.8 μΩ cm, which was much lower than that of alloy films. Consequently, to achieve both agglomeration suppression and low resistivity, the structural modification of the Ag films using Al oxide layers is more useful than alloying the films. | |||||
| 書誌情報 |
Japanese Journal of Applied Physics 巻 47, 号 12, p. 8917-8920, 発行日 2008 |
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| 権利 | ||||||
| 権利情報 | c 2008 The Japan Society of Applied Physics | |||||
| 出版者 | ||||||
| 出版者 | Japan Society of Applied Physics | |||||
| 著者版フラグ | ||||||
| 値 | author | |||||
| 出版タイプ | ||||||
| 出版タイプ | AM | |||||
| 出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
