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{"_buckets": {"deposit": "94e2e679-19c3-4afa-a2bf-df818a235a31"}, "_deposit": {"id": "8466", "owners": [], "pid": {"revision_id": 0, "type": "depid", "value": "8466"}, "status": "published"}, "_oai": {"id": "oai:kitami-it.repo.nii.ac.jp:00008466", "sets": ["1:86"]}, "author_link": ["44880", "44879", "44631", "44632", "44633", "44634"], "item_1646810750418": {"attribute_name": "\u51fa\u7248\u30bf\u30a4\u30d7", "attribute_value_mlt": [{"subitem_version_resource": "http://purl.org/coar/version/c_ab4af688f83e57aa", "subitem_version_type": "AM"}]}, "item_3_biblio_info_186": {"attribute_name": "\u66f8\u8a8c\u60c5\u5831", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2008", "bibliographicIssueDateType": "Issued"}, "bibliographicIssueNumber": "12", "bibliographicPageEnd": "8920", "bibliographicPageStart": "8917", "bibliographicVolumeNumber": "47", "bibliographic_titles": [{"bibliographic_title": "Japanese Journal of Applied Physics"}]}]}, "item_3_description_184": {"attribute_name": "\u6284\u9332", "attribute_value_mlt": [{"subitem_description": "Ag has long been of interest for use as a low-resistivity electrode material, but the problem of agglomeration caused by annealing must be resolved. One of the solutions is alloying Ag, but this often causes an increase in electrical resistivity. In this study, thermal stability of Ag thin films modified with thin Al oxide layers was investigated from the viewpoints of surface morphology and resistivity. It was found that agglomeration was suppressed in the multilayer films even after annealing at 600 \u00b0C, similarly to Ag(Al) alloy films, which were investigated previously. As a result, it was suggested that the presence of the Al oxide layers at the film surface and interface played a major role in suppressing agglomeration in Ag(Al) films. Moreover, the resistivity of the multilayer film was 1.8 \u03bc\u03a9 cm, which was much lower than that of alloy films. Consequently, to achieve both agglomeration suppression and low resistivity, the structural modification of the Ag films using Al oxide layers is more useful than alloying the films.", "subitem_description_type": "Abstract"}]}, "item_3_full_name_183": {"attribute_name": "\u8457\u8005\u5225\u540d", "attribute_value_mlt": [{"nameIdentifiers": [{"nameIdentifier": "44880", "nameIdentifierScheme": "WEKO"}, {"nameIdentifier": "70261401", "nameIdentifierScheme": "KAKEN", "nameIdentifierURI": "https://nrid.nii.ac.jp/ja/nrid/1000070261401 "}], "names": [{"name": "\u5ddd\u6751, \u307f\u3069\u308a", "nameLang": "ja"}]}, {"nameIdentifiers": [{"nameIdentifier": "44879", "nameIdentifierScheme": "WEKO"}, {"nameIdentifier": "20261399", "nameIdentifierScheme": "KAKEN", "nameIdentifierURI": "https://nrid.nii.ac.jp/ja/nrid/1000020261399 "}], "names": [{"name": "\u963f\u90e8, \u826f\u592b", "nameLang": "ja"}]}]}, "item_3_publisher_212": {"attribute_name": "\u51fa\u7248\u8005", "attribute_value_mlt": [{"subitem_publisher": "Japan Society of Applied Physics"}]}, "item_3_rights_192": {"attribute_name": "\u6a29\u5229", "attribute_value_mlt": [{"subitem_rights": "c 2008 The Japan Society of Applied Physics"}]}, "item_3_select_195": {"attribute_name": "\u8457\u8005\u7248\u30d5\u30e9\u30b0", "attribute_value_mlt": [{"subitem_select_item": "author"}]}, "item_3_subject_196": {"attribute_name": "\u65e5\u672c\u5341\u9032\u5206\u985e\u6cd5", "attribute_value_mlt": [{"subitem_subject": "420", "subitem_subject_scheme": "NDC"}]}, "item_access_right": {"attribute_name": "\u30a2\u30af\u30bb\u30b9\u6a29", "attribute_value_mlt": [{"subitem_access_right": "open access", "subitem_access_right_uri": "http://purl.org/coar/access_right/c_abf2"}]}, "item_creator": {"attribute_name": "\u8457\u8005", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "Kawamura, Midori", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "44631", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Inami, Yuuki", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "44632", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Abe, Yoshio", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "44633", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Sasaki, Katsutaka", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "44634", "nameIdentifierScheme": "WEKO"}]}]}, "item_files": {"attribute_name": "\u30d5\u30a1\u30a4\u30eb\u60c5\u5831", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2017-01-12"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "No.15-Kawamura.pdf", "filesize": [{"value": "318.1 kB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensetype": "license_note", "mimetype": "application/pdf", "size": 318100.0, "url": {"label": "No.15-Kawamura.pdf", "url": "https://kitami-it.repo.nii.ac.jp/record/8466/files/No.15-Kawamura.pdf"}, "version_id": "a9de8632-28f2-47d9-8892-e107b326e028"}]}, "item_keyword": {"attribute_name": "\u30ad\u30fc\u30ef\u30fc\u30c9", "attribute_value_mlt": [{"subitem_subject": "Ag thin film", "subitem_subject_scheme": "Other"}, {"subitem_subject": "electrode", "subitem_subject_scheme": "Other"}, {"subitem_subject": "agglomeration suppression", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Al oxide layer", "subitem_subject_scheme": "Other"}, {"subitem_subject": "modification", "subitem_subject_scheme": "Other"}, {"subitem_subject": "resistivity", "subitem_subject_scheme": "Other"}]}, "item_language": {"attribute_name": "\u8a00\u8a9e", "attribute_value_mlt": [{"subitem_language": "eng"}]}, "item_resource_type": {"attribute_name": "\u8cc7\u6e90\u30bf\u30a4\u30d7", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "Thermally Stable Ag Thin Films Modified with Very Thin Al Oxide Layers", "item_titles": {"attribute_name": "\u30bf\u30a4\u30c8\u30eb", "attribute_value_mlt": [{"subitem_title": "Thermally Stable Ag Thin Films Modified with Very Thin Al Oxide Layers", "subitem_title_language": "en"}]}, "item_type_id": "3", "owner": "1", "path": ["1/86"], "permalink_uri": "https://kitami-it.repo.nii.ac.jp/records/8466", "pubdate": {"attribute_name": "PubDate", "attribute_value": "2016-09-08"}, "publish_date": "2016-09-08", "publish_status": "0", "recid": "8466", "relation": {}, "relation_version_is_last": true, "title": ["Thermally Stable Ag Thin Films Modified with Very Thin Al Oxide Layers"], "weko_shared_id": -1}
  1. 学術雑誌掲載済論文
  2. 和雑誌

Thermally Stable Ag Thin Films Modified with Very Thin Al Oxide Layers

https://kitami-it.repo.nii.ac.jp/records/8466
e1118d6b-bee2-4e36-9c69-0b297b9261b9
名前 / ファイル ライセンス アクション
No.15-Kawamura.pdf No.15-Kawamura.pdf (318.1 kB)
Item type 学術雑誌論文 / Journal Article(1)
公開日 2016-09-08
タイトル
言語 en
タイトル Thermally Stable Ag Thin Films Modified with Very Thin Al Oxide Layers
言語
言語 eng
キーワード
主題Scheme Other
主題 Ag thin film
キーワード
主題Scheme Other
主題 electrode
キーワード
主題Scheme Other
主題 agglomeration suppression
キーワード
主題Scheme Other
主題 Al oxide layer
キーワード
主題Scheme Other
主題 modification
キーワード
主題Scheme Other
主題 resistivity
資源タイプ
資源 http://purl.org/coar/resource_type/c_6501
タイプ journal article
アクセス権
アクセス権 open access
アクセス権URI http://purl.org/coar/access_right/c_abf2
著者 Kawamura, Midori

× Kawamura, Midori

WEKO 44631

en Kawamura, Midori

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Inami, Yuuki

× Inami, Yuuki

WEKO 44632

en Inami, Yuuki

Search repository
Abe, Yoshio

× Abe, Yoshio

WEKO 44633

en Abe, Yoshio

Search repository
Sasaki, Katsutaka

× Sasaki, Katsutaka

WEKO 44634

en Sasaki, Katsutaka

Search repository
著者別名
姓名
姓名 川村, みどり
言語 ja
著者別名
姓名
姓名 阿部, 良夫
言語 ja
抄録
内容記述タイプ Abstract
内容記述 Ag has long been of interest for use as a low-resistivity electrode material, but the problem of agglomeration caused by annealing must be resolved. One of the solutions is alloying Ag, but this often causes an increase in electrical resistivity. In this study, thermal stability of Ag thin films modified with thin Al oxide layers was investigated from the viewpoints of surface morphology and resistivity. It was found that agglomeration was suppressed in the multilayer films even after annealing at 600 °C, similarly to Ag(Al) alloy films, which were investigated previously. As a result, it was suggested that the presence of the Al oxide layers at the film surface and interface played a major role in suppressing agglomeration in Ag(Al) films. Moreover, the resistivity of the multilayer film was 1.8 μΩ cm, which was much lower than that of alloy films. Consequently, to achieve both agglomeration suppression and low resistivity, the structural modification of the Ag films using Al oxide layers is more useful than alloying the films.
書誌情報 Japanese Journal of Applied Physics

巻 47, 号 12, p. 8917-8920, 発行日 2008
権利
権利情報 c 2008 The Japan Society of Applied Physics
出版者
出版者 Japan Society of Applied Physics
著者版フラグ
値 author
出版タイプ
出版タイプ AM
出版タイプResource http://purl.org/coar/version/c_ab4af688f83e57aa
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