| Item type |
学術雑誌論文 / Journal Article(1) |
| 公開日 |
2016-09-08 |
| タイトル |
|
|
タイトル |
Thermal stability of Ag Films with Various Interface Layers |
|
言語 |
en |
| 言語 |
|
|
言語 |
eng |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
Ag film |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
Interface layer |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
Thermal stability |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
Adhesion |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
Crystal orientation |
| 資源タイプ |
|
|
資源 |
http://purl.org/coar/resource_type/c_6501 |
|
タイプ |
journal article |
| アクセス権 |
|
|
アクセス権URI |
open access |
| 著者 |
Zhang, Ziyang
Kawamura, Midori
Abe, Yoshio
Kim, Kyung Ho
|
| 抄録 |
|
|
内容記述タイプ |
Abstract |
|
内容記述 |
The effects of Pd, Ni, Nb, and Ti interface layers on the thermal stability of Ag films were investigated, and those metals that are appropriate for the interface layers were summarized. The results indicated that Ti and Nb interface layers resulted in thermally stable Ag films by improving the adhesion strength of the Ag films to SiO2 substrates and by enhancing the crystal orientation of Ag(111). It was determined that appropriate interface layer metals for Ag film should have a large Gibbs free energy of formation for the oxide and an appropriate atomic diameter ratio of dmetal/dAg. |
| 書誌情報 |
Japanese Journal of Applied Physics
巻 53,
号 4,
p. 048003,
発行日 2014
|
| 権利 |
|
|
権利情報 |
c 2014 The Japan Society of Applied Physics |
| 出版者 |
|
|
出版者 |
The Japan Society of Applied Physics |
| 著者版フラグ |
|
|
言語 |
en |
|
値 |
author |
| 出版タイプ |
|
|
出版タイプ |
AM |
|
出版タイプResource |
http://purl.org/coar/version/c_ab4af688f83e57aa |
No.13-Kawamura.pdf (562.3 kB)
