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Thermally stable very thin Ag films for electrodes
https://kitami-it.repo.nii.ac.jp/records/8462
https://kitami-it.repo.nii.ac.jp/records/846257c1cae0-aeb5-4032-85b2-89512263b871
| 名前 / ファイル | ライセンス | アクション |
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FukudaJVSTA.pdf (613.2 kB)
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| Item type | 学術雑誌論文 / Journal Article(1) | |||||||||||||||
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| 公開日 | 2016-09-07 | |||||||||||||||
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| タイトル | Thermally stable very thin Ag films for electrodes | |||||||||||||||
| 言語 | en | |||||||||||||||
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| 言語 | eng | |||||||||||||||
| 資源タイプ | ||||||||||||||||
| 資源 | http://purl.org/coar/resource_type/c_6501 | |||||||||||||||
| タイプ | journal article | |||||||||||||||
| アクセス権 | ||||||||||||||||
| アクセス権 | open access | |||||||||||||||
| アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||||||||||||
| 著者 |
Kawamura, M
× Kawamura, M
× Fukuda, D
× Inami, Y
× Abe, Y
× Sasaki, K
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| 抄録 | ||||||||||||||||
| 内容記述タイプ | Abstract | |||||||||||||||
| 内容記述 | Low-resistivity metals such as Cu and Ag have been investigated for substitution of Al alloy films in the electrodes of thin film transistor used in active matrix liquid crystal displays. Though Ag has the drawback of agglomerating easily during heat treatment, improved thermal stability by modification of the Ag film into an Al∕Ag∕Al Al∕Ag∕Al structure has been confirmed. In this paper, the surface morphology and electrical resistivity of this structure with various Ag layer thicknesses (from 95to50nm 95to50nm ) are investigated. The Al∕Ag∕Al Al∕Ag∕Al structure showed excellent stability after annealing at 600°C 600°C in vacuum, even with reduced thickness. The resistivity of the Al∕Ag(95nm)∕Al Al∕Ag(95nm)∕Al film and of the Al∕Ag(50nm)∕Al Al∕Ag(50nm)∕Al film after annealing were 1.8 and 2.4μΩcm 2.4μΩcm , respectively. For comparison, properties of Ag films with the same thickness were investigated, but these films became discontinuous after annealing due to agglomeration. Modified Ag films maintained excellent properties after annealing, even when the Ag layer thickness was reduced. |
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| 書誌情報 |
Journal of Vacuum Science and Technology A 巻 27, 号 4, p. 975-978, 発行日 2009 |
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| 識別子タイプ | DOI | |||||||||||||||
| 関連識別子 | https://doi.org/10.1116/1.3071968 | |||||||||||||||
| 権利 | ||||||||||||||||
| 権利情報 | c 2009 American Vacuum Society | |||||||||||||||
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| 出版者 | American Vacuum Society | |||||||||||||||
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| 言語 | en | |||||||||||||||
| 値 | publisher | |||||||||||||||
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| 出版タイプ | VoR | |||||||||||||||
| 出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||||||||||||
