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Low-temperature fabrication of fine structures on glass using electrical nanoimprint and chemical etching
https://kitami-it.repo.nii.ac.jp/records/8258
https://kitami-it.repo.nii.ac.jp/records/82580b2ef66e-d76b-4e76-ab36-1c243b0db9ff
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
２出版社版.pdf (1.5 MB)
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| Item type | 学術雑誌論文 / Journal Article(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2016-07-07 | |||||
| タイトル | ||||||
| タイトル | Low-temperature fabrication of fine structures on glass using electrical nanoimprint and chemical etching | |||||
| 言語 | en | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | journal article | |||||
| アクセス権 | ||||||
| アクセス権 | open access | |||||
| アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
| 著者 |
Ikutame, Naoki
× Ikutame, Naoki× Kawaguchi, Keiga× Ikeda, Hiroshi× Sakai, Daisuke× Harada, Kenji× Funatsu, Shiro× Nishii, Junji |
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| 著者別名 | ||||||
| 識別子Scheme | WEKO | |||||
| 識別子 | 44856 | |||||
| 識別子Scheme | KAKEN | |||||
| 識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000010534232 | |||||
| 識別子 | 10534232 | |||||
| 姓名 | 酒井, 大輔 | |||||
| 言語 | ja | |||||
| 著者別名 | ||||||
| 識別子Scheme | WEKO | |||||
| 識別子 | 44857 | |||||
| 識別子Scheme | KAKEN | |||||
| 識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000030312820 | |||||
| 識別子 | 30312820 | |||||
| 姓名 | 原田, 建治 | |||||
| 言語 | ja | |||||
| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | Periodic structures were imprinted on a soda lime glass surface below its glass transition temperature (T g) using a carbon-coated SiO2 mold under application of DC voltage. The structure height increased with the applied DC voltage, although no significant increase with pressure was found. At a temperature around T g, the height reached saturation. Chemical etching using 55% KOH solution at 70?°C increased the structure height to eight times the height before etching. Noticeable alternating depression patterns and rapid chemical etching are closely related with the selective decrease in sodium concentration, which occurred only in the surface areas that were pressurized by the mold. | |||||
| 書誌情報 |
en : J. Appl. Phys. 巻 114, 号 083514, 発行日 2013-08 |
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| DOI | ||||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | https://doi.org/10.1063/1.4819321 | |||||
| 権利 | ||||||
| 権利情報 | c 2013 AIP Publishing LLC | |||||
| 出版者 | ||||||
| 出版者 | American Institute of Physics (AIP) | |||||
| 著者版フラグ | ||||||
| 値 | publisher | |||||
| 出版タイプ | ||||||
| 出版タイプ | VoR | |||||
| 出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
