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Effects of total gas flow rate and sputtering power on the critical condition for target mode transition in Al?O2 reactive sputtering
https://kitami-it.repo.nii.ac.jp/records/7495
https://kitami-it.repo.nii.ac.jp/records/749579f63283-9fbd-4cb6-b9e1-5c26e3075e73
名前 / ファイル | ライセンス | アクション |
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Vacuum_84_629_Chiba.pdf (325.8 kB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2011-02-03 | |||||
タイトル | ||||||
タイトル | Effects of total gas flow rate and sputtering power on the critical condition for target mode transition in Al?O2 reactive sputtering | |||||
言語 | en | |||||
言語 | ||||||
言語 | eng | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | reactive sputtering | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | plasma emission intensity | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | target voltage | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | gettering effect | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
アクセス権 | ||||||
アクセス権 | open access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
著者 |
Chiba, Y
× Chiba, Y× Abe, Y× Kawamura, M× Sasaki, K |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | Reactive sputtering is one of the most commonly used techniques for the fabrication of compound thin films, and the critical condition for target mode transition from metal mode to oxide mode is very important. We investigated the effects of total gas flow rate and sputtering power on the critical condition in Al-O2 reactive sputtering. It was found that the ratio of the number of sputtered Al atoms (NAl) to the number of supplied O atoms (NO) at the critical condition was almost constant, and the ratio of NAl to NO was close to the stoichiometric ratio of Al2O3 (2 to 3). It is thought that the introduced oxygen is gettered by Al atoms almost completely and the target remains in the metal mode below the critical condition. By increasing the amount of supplied O atoms above the stoichiometric ratio of Al2O3, the oxygen supply overcomes the gettering effect. Then, oxygen concentration in the plasma increases abruptly and the target mode changes from metal mode to oxide mode. | |||||
書誌情報 |
Vacuum 巻 84, 号 5, p. 629-632, 発行日 2009-10 |
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DOI | ||||||
識別子タイプ | DOI | |||||
関連識別子 | http://doi.org/10.1016/j.vacuum.2009.06.024 | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf | |||||
出版者 | ||||||
出版者 | Elsevier | |||||
著者版フラグ | ||||||
値 | author | |||||
出版タイプ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa |