ログイン
言語:

WEKO3

  • トップ
  • ランキング
To
lat lon distance
To

Field does not validate



インデックスリンク

インデックスツリー

メールアドレスを入力してください。

WEKO

One fine body…

WEKO

One fine body…

アイテム

  1. 学術雑誌論文
  2. 洋雑誌

Nanoindentation tests on diamond-machined silicon wafers

https://kitami-it.repo.nii.ac.jp/records/6971
https://kitami-it.repo.nii.ac.jp/records/6971
dd42e7bc-486c-4764-b0b2-560d385af848
名前 / ファイル ライセンス アクション
4101.pdf 4101.pdf (3.2 MB)
Item type 学術雑誌論文 / Journal Article(1)
公開日 2007-05-08
タイトル
タイトル Nanoindentation tests on diamond-machined silicon wafers
言語 en
言語
言語 eng
資源タイプ
資源 http://purl.org/coar/resource_type/c_6501
タイプ journal article
アクセス権
アクセス権 open access
アクセス権URI http://purl.org/coar/access_right/c_abf2
著者 Yan, Jiwang

× Yan, Jiwang

en Yan, Jiwang

Search repository
Takahashi, Hirokazu

× Takahashi, Hirokazu

en Takahashi, Hirokazu

Search repository
Tamaki, Jun-ichi

× Tamaki, Jun-ichi

en Tamaki, Jun-ichi

Search repository
Gai, Xiaohui

× Gai, Xiaohui

en Gai, Xiaohui

Search repository
Harada, Hirofumi

× Harada, Hirofumi

en Harada, Hirofumi

Search repository
Patten, John

× Patten, John

en Patten, John

Search repository
抄録
内容記述タイプ Abstract
内容記述 Nanoindentation tests were performed on ultraprecision diamond-turned silicon wafers and the results were compared with those of pristine silicon wafers. Remarkable differences were found between the two kinds of test results in terms of load-displacement characteristics and indent topologies. The machining-induced amorphous layer was found to have significantly higher microplasticity and lower hardness than pristine silicon. When machining silicon in the ductile mode, we are in essence always machining amorphous silicon left behind by the preceding tool pass; thus, it is the amorphous phase that dominates the machining performance. This work indicated the feasibility of detecting the presence and the mechanical properties of the machining-induced amorphous layers by nanoindentation.
書誌情報 Applied Physics Letters

巻 86, p. 181913-1-181913-3, 発行日 2005-05
DOI
識別子タイプ DOI
関連識別子 http://doi.org/10.1063/1.1924895
権利
権利情報 The following article appeared in J.Yan, H.Takahashi, J.Tamaki, X.Gai, H.Harada, J.Patten, Applied Physics Letters, 86, 181913-1-181913-3, (2005) and may be found at http://link.aip.org/link/?apl/86/181913-1.
権利
権利情報 Copyright 2005 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.
出版者
出版者 American Institute of Physics
言語 en
著者版フラグ
言語 en
値 publisher
出版タイプ
出版タイプ VoR
出版タイプResource http://purl.org/coar/version/c_970fb48d4fbd8a85
戻る
0
views
See details
Views

Versions

Ver.1 2021-03-01 06:24:22.811378
Show All versions

Share

Mendeley Twitter Facebook Print Addthis

Cite as

エクスポート

OAI-PMH
  • OAI-PMH JPCOAR 2.0
  • OAI-PMH JPCOAR 1.0
  • OAI-PMH DublinCore
  • OAI-PMH DDI
Other Formats
  • JSON
  • BIBTEX

Confirm


Powered by WEKO3


Powered by WEKO3