WEKO3
-
RootNode
アイテム
Optical and electrochromic properties of RF reactively sputtered WO_3 films
https://kitami-it.repo.nii.ac.jp/records/6901
https://kitami-it.repo.nii.ac.jp/records/6901c7c6035d-aeb3-4dc4-a32c-07d4d9933a6f
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
4593.pdf (542.4 kB)
|
|
| Item type | 学術雑誌論文 / Journal Article(1) | |||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| 公開日 | 2007-04-19 | |||||||||||||||
| タイトル | ||||||||||||||||
| タイトル | Optical and electrochromic properties of RF reactively sputtered WO_3 films | |||||||||||||||
| 言語 | en | |||||||||||||||
| 言語 | ||||||||||||||||
| 言語 | eng | |||||||||||||||
| 資源タイプ | ||||||||||||||||
| 資源 | http://purl.org/coar/resource_type/c_6501 | |||||||||||||||
| タイプ | journal article | |||||||||||||||
| アクセス権 | ||||||||||||||||
| アクセス権 | open access | |||||||||||||||
| アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||||||||||||
| 著者 |
Washizu, E.
× Washizu, E.
× Yamamoto, A.
× Abe, Y.
× Kawamura, M.
× Sasaki, K.
|
|||||||||||||||
| 著者別名 | ||||||||||||||||
| 識別子Scheme | WEKO | |||||||||||||||
| 識別子 | 44879 | |||||||||||||||
| 識別子Scheme | KAKEN | |||||||||||||||
| 識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000020261399 | |||||||||||||||
| 識別子 | 20261399 | |||||||||||||||
| 姓名 | 阿部, 良夫 | |||||||||||||||
| 言語 | ja | |||||||||||||||
| 著者別名 | ||||||||||||||||
| 識別子Scheme | WEKO | |||||||||||||||
| 識別子 | 44880 | |||||||||||||||
| 識別子Scheme | KAKEN | |||||||||||||||
| 識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000070261401 | |||||||||||||||
| 識別子 | 70261401 | |||||||||||||||
| 姓名 | 川村, みどり | |||||||||||||||
| 言語 | ja | |||||||||||||||
| 著者別名 | ||||||||||||||||
| 識別子Scheme | WEKO | |||||||||||||||
| 識別子 | 34911 | |||||||||||||||
| 姓名 | 佐々木, 克孝 | |||||||||||||||
| 言語 | ja | |||||||||||||||
| 抄録 | ||||||||||||||||
| 内容記述タイプ | Abstract | |||||||||||||||
| 内容記述 | The effects of deposition conditions, including substrate temperature and sputtering gas pressure, on the optical and electrochromic (EC) properties of WO_3 films prepared by RF reactive sputtering were investigated. The maximum optical band gap energy of 3.15 eV was obtained on a room-temperature substrate temperature, and decreased with increasing substrate temperature. However, the maximum refractive index of about 2.5 was obtained at a sputtering gas pressure of 5 mTorr and a substrate temperature of 500°C, and decreased with decreasing substrate temperature and with increasing pressure. The decrease in bandgap energy and refractive index are thought to have been caused by an increase in WO_3 cluster size and a decrease in film density, respectively. Electrochromic (EC) response times of the WO_3 films were measured in an electrolyte of 1N H_2SO_4 aqueous solution. Fast EC responses were obtained for the WO_3 films with wide band gap energies and low refractive indices. The results indicate that the optical properties of WO_3 films are useful indicators of EC response. | |||||||||||||||
| 書誌情報 |
Solid State Ionics 巻 165, 号 1-4, p. 175-180, 発行日 2003-12 |
|||||||||||||||
| DOI | ||||||||||||||||
| 識別子タイプ | DOI | |||||||||||||||
| 関連識別子 | http://doi.org/10.1016/j.ssi.2003.08.030 | |||||||||||||||
| 権利 | ||||||||||||||||
| 権利情報 | http://www.sciencedirect.com/science/journal/01672738 | |||||||||||||||
| 権利 | ||||||||||||||||
| 権利情報 | Elsevier B.V., E. Washizu, A. Yamamoto, Y. Abe, M. Kawamura and K. Sasaki, Solid State Ionics, 165(1-4), 2003, 175-180. | |||||||||||||||
| フォーマット | ||||||||||||||||
| 内容記述タイプ | Other | |||||||||||||||
| 内容記述 | application/pdf | |||||||||||||||
| 出版者 | ||||||||||||||||
| 出版者 | Elsevier | |||||||||||||||
| 言語 | en | |||||||||||||||
| 著者版フラグ | ||||||||||||||||
| 言語 | en | |||||||||||||||
| 値 | author | |||||||||||||||
| 出版タイプ | ||||||||||||||||
| 出版タイプ | AM | |||||||||||||||
| 出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||||||||||||
Share
Cite as
Washizu, E., Yamamoto, A., Abe, Y., Kawamura, M., Sasaki, K., 2003, Optical and electrochromic properties of RF reactively sputtered WO_3 films: Elsevier, 175–180 p.
Loading...
