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Orientation of metal films deposited by sputtering using Ar/N_2 gas mixtures
https://kitami-it.repo.nii.ac.jp/records/6899
https://kitami-it.repo.nii.ac.jp/records/6899ed6899fc-b4e0-441c-8031-c7839c7ffe5a
名前 / ファイル | ライセンス | アクション |
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2007-04-19 | |||||
タイトル | ||||||
タイトル | Orientation of metal films deposited by sputtering using Ar/N_2 gas mixtures | |||||
言語 | en | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
アクセス権 | ||||||
アクセス権 | open access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
著者 |
Kawamura, Midori
× Kawamura, Midori× Abe, Yoshio× Sasaki, Katsutaka |
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著者別名 | ||||||
識別子Scheme | WEKO | |||||
識別子 | 44880 | |||||
識別子Scheme | KAKEN | |||||
識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000070261401 | |||||
識別子 | 70261401 | |||||
姓名 | 川村, みどり | |||||
言語 | ja | |||||
著者別名 | ||||||
識別子Scheme | WEKO | |||||
識別子 | 44879 | |||||
識別子Scheme | KAKEN | |||||
識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000020261399 | |||||
識別子 | 20261399 | |||||
姓名 | 阿部, 良夫 | |||||
言語 | ja | |||||
著者別名 | ||||||
識別子Scheme | WEKO | |||||
識別子 | 34897 | |||||
姓名 | 佐々木, 克孝 | |||||
言語 | ja | |||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | The influence of adding N_2 to the sputtering gas on the crystal orientation of metal films was investigated. We observed a crystal orientation change of Ni films from (111) to (100) upon the addition of N_2 into the sputtering gas. The increase of substrate temperature resulted in higher degree of orientation of Ni films. Applying a similar deposition condition, Ag and Cu films were also deposited. However, no change was observed for Ag films. Cu films deposited at room temperature showed orientation change but the crystallinity became poor due to the incorporation of nitrogen. It is considered that the difference in the influence of N_2 addition is a result of the strength of interaction between nitrogen and metals. We must determine the suitable deposition conditions for the orientation change. | |||||
書誌情報 |
Thin Solid Films 巻 469-470, p. 491-494, 発行日 2004-12 |
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DOI | ||||||
識別子タイプ | DOI | |||||
関連識別子 | http://doi.org/10.1016/j.tsf.2004.06.175 | |||||
権利 | ||||||
権利情報 | http://www.sciencedirect.com/science/journal/00406090 | |||||
権利 | ||||||
権利情報 | Elsevier B.V., Midori Kawamura, Yoshio Abe and Katsutaka Sasaki, Thin Solid Films, 469-470, 2004, 491-494. | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf | |||||
出版者 | ||||||
出版者 | Elsevier | |||||
言語 | en | |||||
著者版フラグ | ||||||
言語 | en | |||||
値 | author | |||||
出版タイプ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa |