{"_buckets": {"deposit": "ca07df8c-8f68-403c-a479-dc85b97def0f"}, "_deposit": {"id": "6827", "owners": [], "pid": {"revision_id": 0, "type": "depid", "value": "6827"}, "status": "published"}, "_oai": {"id": "oai:kitami-it.repo.nii.ac.jp:00006827", "sets": ["87"]}, "author_link": ["44879", "44880", "34481", "34475", "34476", "34477", "34478"], "item_1646810750418": {"attribute_name": "出版タイプ", "attribute_value_mlt": [{"subitem_version_resource": "http://purl.org/coar/version/c_970fb48d4fbd8a85", "subitem_version_type": "VoR"}]}, "item_3_biblio_info_186": {"attribute_name": "書誌情報", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2005-09", "bibliographicIssueDateType": "Issued"}, "bibliographicIssueNumber": "5", "bibliographicPageEnd": "1374", "bibliographicPageStart": "1371", "bibliographicVolumeNumber": "23", "bibliographic_titles": [{"bibliographic_title": "Journal of Vacuum Science \u0026 Technology A: Vacuum, Surfaces, and Films"}]}]}, "item_3_description_184": {"attribute_name": "抄録", "attribute_value_mlt": [{"subitem_description": "Reactive sputtering is one of the most widely used techniques for preparing compound thin films. In this study, a Ti model target, a 1 μm thick Ti film sputter deposited on a Si wafer, was used as the sputtering target. The thickness of the oxide layer formed on the surface of the model target after sputtering in an Ar+O_2 mixed gas atmosphere was measured by ellipsometry under various varying processing parameters including oxygen flow ratio, sputtering time, rf power, and total gas pressure. The oxide layer thickness was varied from a few nanometers to approximately 100 nm by changing the parameters, and a nonuniform oxide layer thickness was observed on the target surface.", "subitem_description_type": "Abstract"}]}, "item_3_description_194": {"attribute_name": "フォーマット", "attribute_value_mlt": [{"subitem_description": "application/pdf", "subitem_description_type": "Other"}]}, "item_3_full_name_183": {"attribute_name": "著者別名", "attribute_value_mlt": [{"nameIdentifiers": [{"nameIdentifier": "44879", "nameIdentifierScheme": "WEKO"}, {"nameIdentifier": "20261399", "nameIdentifierScheme": "KAKEN", "nameIdentifierURI": "https://nrid.nii.ac.jp/ja/nrid/1000020261399 "}], "names": [{"name": "阿部, 良夫", "nameLang": "ja"}]}, {"nameIdentifiers": [{"nameIdentifier": "44880", "nameIdentifierScheme": "WEKO"}, {"nameIdentifier": "70261401", "nameIdentifierScheme": "KAKEN", "nameIdentifierURI": "https://nrid.nii.ac.jp/ja/nrid/1000070261401 "}], "names": [{"name": "川村, みどり", "nameLang": "ja"}]}, {"nameIdentifiers": [{"nameIdentifier": "34481", "nameIdentifierScheme": "WEKO"}], "names": [{"name": "佐々木, 克孝", "nameLang": "ja"}]}]}, "item_3_publisher_212": {"attribute_name": "出版者", "attribute_value_mlt": [{"subitem_publisher": "American Institute of Physics"}]}, "item_3_relation_191": {"attribute_name": "DOI", "attribute_value_mlt": [{"subitem_relation_type_id": {"subitem_relation_type_id_text": "http://doi.org/10.1116/1.2006135", "subitem_relation_type_select": "DOI"}}]}, "item_3_rights_192": {"attribute_name": "権利", "attribute_value_mlt": [{"subitem_rights": "The following article appeared in Yoshio Abe, Kenji Takamura, Midori Kawamura, and Katsutaka Sasaki, Journal of Vacuum Science \u0026 Technology A: Vacuum, Surfaces, and Films, 23(5), 1371-1374, (2005) and may be found at http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal\u0026id=JVTAD6000023000005001371000001\u0026idtype=cvips\u0026gifs=Yes."}, {"subitem_rights": "Copyright 2005 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics."}]}, "item_3_select_195": {"attribute_name": "著者版フラグ", "attribute_value_mlt": [{"subitem_select_item": "publisher"}]}, "item_3_subject_196": {"attribute_name": "日本十進分類法", "attribute_value_mlt": [{"subitem_subject": "540", "subitem_subject_scheme": "NDC"}]}, "item_access_right": {"attribute_name": "アクセス権", "attribute_value_mlt": [{"subitem_access_right": "open access", "subitem_access_right_uri": "http://purl.org/coar/access_right/c_abf2"}]}, "item_creator": {"attribute_name": "著者", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "Abe, Yoshio", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "34475", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Takamura, Kenji", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "34476", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Kawamura, Midori", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "34477", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Sasaki, Katsutaka", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "34478", "nameIdentifierScheme": "WEKO"}]}]}, "item_files": {"attribute_name": "ファイル情報", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2016-11-22"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "4284.pdf", "filesize": [{"value": "83.8 kB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensetype": "license_note", "mimetype": "application/pdf", "size": 83800.0, "url": {"label": "4284.pdf", "url": "https://kitami-it.repo.nii.ac.jp/record/6827/files/4284.pdf"}, "version_id": "e393a5a7-6500-4fd2-9639-0ad3370b98fa"}]}, "item_language": {"attribute_name": "言語", "attribute_value_mlt": [{"subitem_language": "eng"}]}, "item_resource_type": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "Target surface oxide layer formed by reactive sputtering of Ti target in Ar+O_2 mixed gas", "item_titles": {"attribute_name": "タイトル", "attribute_value_mlt": [{"subitem_title": "Target surface oxide layer formed by reactive sputtering of Ti target in Ar+O_2 mixed gas", "subitem_title_language": "en"}]}, "item_type_id": "3", "owner": "1", "path": ["87"], "permalink_uri": "https://kitami-it.repo.nii.ac.jp/records/6827", "pubdate": {"attribute_name": "PubDate", "attribute_value": "2007-04-17"}, "publish_date": "2007-04-17", "publish_status": "0", "recid": "6827", "relation": {}, "relation_version_is_last": true, "title": ["Target surface oxide layer formed by reactive sputtering of Ti target in Ar+O_2 mixed gas"], "weko_shared_id": -1}