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Target surface oxide layer formed by reactive sputtering of Ti target in Ar+O_2 mixed gas
https://kitami-it.repo.nii.ac.jp/records/6827
https://kitami-it.repo.nii.ac.jp/records/6827cab8619f-7b43-4949-a274-0d45b426032d
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
4284.pdf (83.8 kB)
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| Item type | 学術雑誌論文 / Journal Article(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2007-04-17 | |||||
| タイトル | ||||||
| タイトル | Target surface oxide layer formed by reactive sputtering of Ti target in Ar+O_2 mixed gas | |||||
| 言語 | en | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | journal article | |||||
| アクセス権 | ||||||
| アクセス権 | open access | |||||
| アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
| 著者 |
Abe, Yoshio
× Abe, Yoshio× Takamura, Kenji× Kawamura, Midori× Sasaki, Katsutaka |
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| 著者別名 | ||||||
| 識別子Scheme | WEKO | |||||
| 識別子 | 44879 | |||||
| 識別子Scheme | KAKEN | |||||
| 識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000020261399 | |||||
| 識別子 | 20261399 | |||||
| 姓名 | 阿部, 良夫 | |||||
| 言語 | ja | |||||
| 著者別名 | ||||||
| 識別子Scheme | WEKO | |||||
| 識別子 | 44880 | |||||
| 識別子Scheme | KAKEN | |||||
| 識別子URI | https://nrid.nii.ac.jp/ja/nrid/1000070261401 | |||||
| 識別子 | 70261401 | |||||
| 姓名 | 川村, みどり | |||||
| 言語 | ja | |||||
| 著者別名 | ||||||
| 識別子Scheme | WEKO | |||||
| 識別子 | 34481 | |||||
| 姓名 | 佐々木, 克孝 | |||||
| 言語 | ja | |||||
| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | Reactive sputtering is one of the most widely used techniques for preparing compound thin films. In this study, a Ti model target, a 1 μm thick Ti film sputter deposited on a Si wafer, was used as the sputtering target. The thickness of the oxide layer formed on the surface of the model target after sputtering in an Ar+O_2 mixed gas atmosphere was measured by ellipsometry under various varying processing parameters including oxygen flow ratio, sputtering time, rf power, and total gas pressure. The oxide layer thickness was varied from a few nanometers to approximately 100 nm by changing the parameters, and a nonuniform oxide layer thickness was observed on the target surface. | |||||
| 書誌情報 |
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 巻 23, 号 5, p. 1371-1374, 発行日 2005-09 |
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| DOI | ||||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | http://doi.org/10.1116/1.2006135 | |||||
| 権利 | ||||||
| 権利情報 | The following article appeared in Yoshio Abe, Kenji Takamura, Midori Kawamura, and Katsutaka Sasaki, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 23(5), 1371-1374, (2005) and may be found at http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JVTAD6000023000005001371000001&idtype=cvips&gifs=Yes. | |||||
| 権利 | ||||||
| 権利情報 | Copyright 2005 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. | |||||
| フォーマット | ||||||
| 内容記述タイプ | Other | |||||
| 内容記述 | application/pdf | |||||
| 出版者 | ||||||
| 出版者 | American Institute of Physics | |||||
| 著者版フラグ | ||||||
| 値 | publisher | |||||
| 出版タイプ | ||||||
| 出版タイプ | VoR | |||||
| 出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
