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  1. 学術雑誌掲載済論文
  2. 洋雑誌

Target surface oxide layer formed by reactive sputtering of Ti target in Ar+O_2 mixed gas

https://kitami-it.repo.nii.ac.jp/records/6827
https://kitami-it.repo.nii.ac.jp/records/6827
cab8619f-7b43-4949-a274-0d45b426032d
名前 / ファイル ライセンス アクション
4284.pdf 4284.pdf (83.8 kB)
Item type 学術雑誌論文 / Journal Article(1)
公開日 2007-04-17
タイトル
言語 en
タイトル Target surface oxide layer formed by reactive sputtering of Ti target in Ar+O_2 mixed gas
言語
言語 eng
資源タイプ
資源 http://purl.org/coar/resource_type/c_6501
タイプ journal article
アクセス権
アクセス権 open access
アクセス権URI http://purl.org/coar/access_right/c_abf2
著者 Abe, Yoshio

× Abe, Yoshio

WEKO 34475

en Abe, Yoshio

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Takamura, Kenji

× Takamura, Kenji

WEKO 34476

en Takamura, Kenji

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Kawamura, Midori

× Kawamura, Midori

WEKO 34477

en Kawamura, Midori

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Sasaki, Katsutaka

× Sasaki, Katsutaka

WEKO 34478

en Sasaki, Katsutaka

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著者別名
姓名 阿部, 良夫
言語 ja
著者別名
姓名 川村, みどり
言語 ja
著者別名
姓名 佐々木, 克孝
言語 ja
抄録
内容記述タイプ Abstract
内容記述 Reactive sputtering is one of the most widely used techniques for preparing compound thin films. In this study, a Ti model target, a 1 μm thick Ti film sputter deposited on a Si wafer, was used as the sputtering target. The thickness of the oxide layer formed on the surface of the model target after sputtering in an Ar+O_2 mixed gas atmosphere was measured by ellipsometry under various varying processing parameters including oxygen flow ratio, sputtering time, rf power, and total gas pressure. The oxide layer thickness was varied from a few nanometers to approximately 100 nm by changing the parameters, and a nonuniform oxide layer thickness was observed on the target surface.
書誌情報 Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

巻 23, 号 5, p. 1371-1374, 発行日 2005-09
DOI
識別子タイプ DOI
関連識別子 http://doi.org/10.1116/1.2006135
権利
権利情報 The following article appeared in Yoshio Abe, Kenji Takamura, Midori Kawamura, and Katsutaka Sasaki, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 23(5), 1371-1374, (2005) and may be found at http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JVTAD6000023000005001371000001&idtype=cvips&gifs=Yes.
権利
権利情報 Copyright 2005 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.
フォーマット
内容記述タイプ Other
内容記述 application/pdf
出版者
出版者 American Institute of Physics
著者版フラグ
値 publisher
出版タイプ
出版タイプ VoR
出版タイプResource http://purl.org/coar/version/c_970fb48d4fbd8a85
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