WEKO3
AND
アイテム
{"_buckets": {"deposit": "2a2687dc-7564-4566-b7e0-ae01eb8a036e"}, "_deposit": {"id": "6393", "owners": [], "pid": {"revision_id": 0, "type": "depid", "value": "6393"}, "status": "published"}, "_oai": {"id": "oai:kitami-it.repo.nii.ac.jp:00006393"}, "item_2_alternative_title_18": {"attribute_name": "\u305d\u306e\u4ed6\u306e\u30bf\u30a4\u30c8\u30eb", "attribute_value_mlt": [{"subitem_alternative_title": "Mixed Dielectric Thin Films of a Ta-Ti-O System Prepared by R. F Reactive Sputtering"}]}, "item_2_biblio_info_6": {"attribute_name": "\u66f8\u8a8c\u60c5\u5831", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "1976-06", "bibliographicIssueDateType": "Issued"}, "bibliographicIssueNumber": "2", "bibliographicPageEnd": "303", "bibliographicPageStart": "289", "bibliographicVolumeNumber": "7", "bibliographic_titles": [{"bibliographic_title": "\u5317\u898b\u5de5\u696d\u5927\u5b66\u7814\u7a76\u5831\u544a"}]}]}, "item_2_description_14": {"attribute_name": "\u30d5\u30a9\u30fc\u30de\u30c3\u30c8", "attribute_value_mlt": [{"subitem_description": "application/pdf", "subitem_description_type": "Other"}]}, "item_2_description_4": {"attribute_name": "\u6284\u9332", "attribute_value_mlt": [{"subitem_description": "Mixed dielectric thin films of a Ta-Ti-O system were prepared by R. F. reactive sputtering from the composite targets, which were given several different area ratios, in the sputtering gas of argon-oxygen\uff0815%\uff09mixture.\u3000\u3000\u3000The value of the dielectric constant was varied almost linearly from 30 to 70 with increased Ti area ratios\u3001but that of dielectric loss remained less than 0.04. The addition of a Ta-O system into the Ti?O system markedly improved frequency characteristics of the dielectric constant and loss, and also decreased\u3000the\u3000magnitude of\u3000the leakage current.\u3000\u3000\u3000The structural properties were\u3000investigated by electron diffraction and the results showed that the Ta-Ti-O system included only an amorphous Ti-O system and a polycrystalline Ta-O system.\u3000\u3000\u3000The investigation of the conduction through this dielectric thin films showed that the mechanism was due to the Pool-Frenkel effect.", "subitem_description_type": "Abstract"}]}, "item_2_full_name_3": {"attribute_name": "\u8457\u8005\u5225\u540d", "attribute_value_mlt": [{"nameIdentifiers": [{"nameIdentifier": "32423", "nameIdentifierScheme": "WEKO"}], "names": [{"name": "UMEZAWA, Toshiji"}]}, {"nameIdentifiers": [{"nameIdentifier": "32424", "nameIdentifierScheme": "WEKO"}], "names": [{"name": "YAJIMA, Shozo"}]}]}, "item_2_publisher_32": {"attribute_name": "\u51fa\u7248\u8005", "attribute_value_mlt": [{"subitem_publisher": "\u5317\u898b\u5de5\u696d\u5927\u5b66"}]}, "item_2_select_15": {"attribute_name": "\u8457\u8005\u7248\u30d5\u30e9\u30b0", "attribute_value_mlt": [{"subitem_select_item": "publisher"}]}, "item_creator": {"attribute_name": "\u8457\u8005", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "\u6885\u6ca2, \u5229\u4e8c"}], "nameIdentifiers": [{"nameIdentifier": "32421", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "\u77e2\u5cf6, \u662d\u4e09"}], "nameIdentifiers": [{"nameIdentifier": "32422", "nameIdentifierScheme": "WEKO"}]}]}, "item_files": {"attribute_name": "\u30d5\u30a1\u30a4\u30eb\u60c5\u5831", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2016-11-22"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "7-2-4.pdf", "filesize": [{"value": "6.2 MB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensetype": "license_free", "mimetype": "application/pdf", "size": 6200000.0, "url": {"label": "7-2-4.pdf", "url": "https://kitami-it.repo.nii.ac.jp/record/6393/files/7-2-4.pdf"}, "version_id": "1b76714f-e963-4b78-b286-f1d1d966ab3b"}]}, "item_language": {"attribute_name": "\u8a00\u8a9e", "attribute_value_mlt": [{"subitem_language": "jpn"}]}, "item_resource_type": {"attribute_name": "\u8cc7\u6e90\u30bf\u30a4\u30d7", "attribute_value_mlt": [{"resourcetype": "departmental bulletin paper", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "R\uff0eF\uff0e\u30ea\u30a2\u30af\u30c6\u30a3\u30d6\uff65\u30b9\u30d1\u30c3\u30bf\u6cd5\u306b\u3088\u308bTa-Ti-O\u7cfb\u6df7\u5408\u8a98\u96fb\u4f53\u8584\u819c", "item_titles": {"attribute_name": "\u30bf\u30a4\u30c8\u30eb", "attribute_value_mlt": [{"subitem_title": "R\uff0eF\uff0e\u30ea\u30a2\u30af\u30c6\u30a3\u30d6\uff65\u30b9\u30d1\u30c3\u30bf\u6cd5\u306b\u3088\u308bTa-Ti-O\u7cfb\u6df7\u5408\u8a98\u96fb\u4f53\u8584\u819c"}]}, "item_type_id": "2", "owner": "1", "path": ["7/15/23"], "permalink_uri": "https://kitami-it.repo.nii.ac.jp/records/6393", "pubdate": {"attribute_name": "\u516c\u958b\u65e5", "attribute_value": "2007-04-09"}, "publish_date": "2007-04-09", "publish_status": "0", "recid": "6393", "relation": {}, "relation_version_is_last": true, "title": ["R\uff0eF\uff0e\u30ea\u30a2\u30af\u30c6\u30a3\u30d6\uff65\u30b9\u30d1\u30c3\u30bf\u6cd5\u306b\u3088\u308bTa-Ti-O\u7cfb\u6df7\u5408\u8a98\u96fb\u4f53\u8584\u819c"], "weko_shared_id": 3}
R.F.リアクティブ・スパッタ法によるTa-Ti-O系混合誘電体薄膜
https://kitami-it.repo.nii.ac.jp/records/6393
de420ae6-717c-4723-b47e-b23a7371cb00
名前 / ファイル | ライセンス | アクション | |
---|---|---|---|
![]() |
|
Item type | 紀要論文 / Departmental Bulletin Paper(1) | |||||
---|---|---|---|---|---|---|
公開日 | 2007-04-09 | |||||
タイトル | ||||||
タイトル | R.F.リアクティブ・スパッタ法によるTa-Ti-O系混合誘電体薄膜 | |||||
言語 | ||||||
言語 | jpn | |||||
資源タイプ | ||||||
資源 | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | departmental bulletin paper | |||||
その他のタイトル | ||||||
その他のタイトル | Mixed Dielectric Thin Films of a Ta-Ti-O System Prepared by R. F Reactive Sputtering | |||||
著者 |
梅沢, 利二
× 梅沢, 利二× 矢島, 昭三 |
|||||
著者別名 | ||||||
識別子 | ||||||
識別子 | 32423 | |||||
識別子Scheme | WEKO | |||||
姓名 | ||||||
姓名 | UMEZAWA, Toshiji | |||||
著者別名 | ||||||
識別子 | ||||||
識別子 | 32424 | |||||
識別子Scheme | WEKO | |||||
姓名 | ||||||
姓名 | YAJIMA, Shozo | |||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | Mixed dielectric thin films of a Ta-Ti-O system were prepared by R. F. reactive sputtering from the composite targets, which were given several different area ratios, in the sputtering gas of argon-oxygen(15%)mixture. The value of the dielectric constant was varied almost linearly from 30 to 70 with increased Ti area ratios、but that of dielectric loss remained less than 0.04. The addition of a Ta-O system into the Ti?O system markedly improved frequency characteristics of the dielectric constant and loss, and also decreased the magnitude of the leakage current. The structural properties were investigated by electron diffraction and the results showed that the Ta-Ti-O system included only an amorphous Ti-O system and a polycrystalline Ta-O system. The investigation of the conduction through this dielectric thin films showed that the mechanism was due to the Pool-Frenkel effect. | |||||
書誌情報 |
北見工業大学研究報告 巻 7, 号 2, p. 289-303, 発行日 1976-06 |
|||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf | |||||
著者版フラグ | ||||||
値 | publisher | |||||
出版者 | ||||||
出版者 | 北見工業大学 |