| Item type |
学術雑誌論文 / Journal Article(1) |
| 公開日 |
2024-01-23 |
| タイトル |
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|
タイトル |
Effects of sputtering with Kr gas and insertion of lowermost layer on electrical resistivity of Ag-multilayer |
|
言語 |
en |
| 言語 |
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|
言語 |
eng |
| 資源タイプ |
|
|
資源 |
http://purl.org/coar/resource_type/c_6501 |
|
タイプ |
journal article |
| アクセス権 |
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アクセス権 |
open access |
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アクセス権URI |
http://purl.org/coar/access_right/c_abf2 |
| 著者 |
Koji Mizukoshi
Takafumi Yamamura
Yasuhiro Tomioka
Midori Kawamura
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| 抄録 |
|
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内容記述タイプ |
Abstract |
|
内容記述 |
Silver-based low-emissivity films have been studied to improve window insulation performance. We have reduced the resistivity of Ag in glass/ZnO/Ag structures by inserting a TiO2 in the lowermost layer. In another study, we have also found that the resistivity of Ag thin film can be reduced by changing the sputtering gas from Ar to Kr. In this study, both methods were adapted to achieve even lower resistivity and the factors involved were analyzed in detail. The lowest electrical resistivity achieved was 3.3 μΩ·cm for a combination of a glass/TiO2/ZnO/Ag structure and Kr gas sputtering, which was 2.9% less than that for a glass/TiO2/ZnO/Ag structure with Ar gas sputtering. X-ray diffraction, atomic force microscopy, and secondary ion mass spectroscopy results indicated that the important factor influencing the electrical resistivity was a reduction in the amount of sputtering gas trapped in the Ag layer by depositing the layer using Kr gas. |
|
言語 |
en |
| 書誌情報 |
en : Japanese Journal of Applied Physics
巻 61,
号 9,
発行日 2022-08-19
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| ISSN |
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収録物識別子タイプ |
PISSN |
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収録物識別子 |
0021-4922 |
| DOI |
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|
識別子タイプ |
DOI |
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関連識別子 |
https://doi.org/10.35848/1347-4065/ac829b |
| 権利 |
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言語 |
en |
|
権利情報 |
c 2022 IOP Publishing Ltd |
| 出版者 |
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出版者 |
IOP Publishing |
|
言語 |
en |
| 著者版フラグ |
|
|
言語 |
en |
|
値 |
author |
| 出版タイプ |
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出版タイプ |
AM |
|
出版タイプResource |
http://purl.org/coar/version/c_ab4af688f83e57aa |
10.35848_1347-4065_ac829b.pdf (1.5 MB)
