{"created":"2021-03-01T05:59:51.959737+00:00","id":7411,"links":{},"metadata":{"_buckets":{"deposit":"c20e6bd8-f786-49d4-919c-0a340b67fc45"},"_deposit":{"id":"7411","owners":[],"pid":{"revision_id":0,"type":"depid","value":"7411"},"status":"published"},"_oai":{"id":"oai:kitami-it.repo.nii.ac.jp:00007411","sets":["1:86"]},"author_link":["37933","37934","37935","37936","37937","37938","37927","37928","37929","44879","37931","44880"],"item_1646810750418":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_3_biblio_info_186":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1998","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"7","bibliographicPageEnd":"627","bibliographicPageStart":"619","bibliographicVolumeNumber":"J81-C-II","bibliographic_titles":[{"bibliographic_title":"電子情報通信学会論文誌"}]}]},"item_3_description_184":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"高耐熱で高信頼性の薄膜キャパシタを実現するため，熱的に高安定な化学量論的Al3Hf金属間化合物膜の作製条件を検討すると共に，Al3Hf陽極酸化膜キャパシタを作製し，そのキャパシタ特性や周波数特性および漏れ電流特性を酸化膜厚の低減効果と耐熱性との関連において検討した。その結果，この陽極酸化膜は，化成電圧を10Vまで低減させて酸化膜の薄膜化を図っても，tanδ，TCCにほとんど変化は見られず，かつ5V印加時の漏れ電流は10－9A台と極めて低い値が得られ，十分な薄膜化が可能であった．また耐熱性の点では，酸化膜厚が比較的厚い160V化成のキャパシタでは540℃まで，酸化膜厚が極めて薄い10V化成の場合では450℃まで，キャパシタ特性と漏れ電流特性に熱劣化は見られず，極めて耐熱性に優れていることがわかった。更に，測定周波数を1kHzから1MHzまで変化させても，静電容量に周波数依存性はほとんど見られなかった。以上の結果から，本研究で用いたAl3Hf陽極酸化膜は，高耐熱で高信頼性薄膜キャパシタ用の誘電体材料として極めて有望と結論できる。","subitem_description_language":"ja","subitem_description_type":"Abstract"}]},"item_3_description_185":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"Copyright 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