| Item type |
学術雑誌論文 / Journal Article(1) |
| 公開日 |
2008-03-12 |
| タイトル |
|
|
タイトル |
Sputter-deposition of Ag films in a nitrogen discharge |
|
言語 |
en |
| 言語 |
|
|
言語 |
eng |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
Crystal orientation |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
Ag film |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
rf sputtering |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
Interaction between nitrogen and metal |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
XRD |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
Electrical resistivity |
| 資源タイプ |
|
|
資源 |
http://purl.org/coar/resource_type/c_6501 |
|
タイプ |
journal article |
| アクセス権 |
|
|
アクセス権 |
open access |
|
アクセス権URI |
http://purl.org/coar/access_right/c_abf2 |
| 著者 |
Kawamura, Midori
Abe, Yoshio
Sasaki, Katsutaka
|
| 抄録 |
|
|
内容記述タイプ |
Abstract |
|
内容記述 |
In general, the presence of a reactive gas in the sputtering atmosphere must be avoided to prevent the formation of any other phases during the preparation of metal films. However, we hypothesized that films of metals, which do not form a nitride phase, could be prepared even in 100% nitrogen. Ag films were sputter-deposited in nitrogen and characterized. We found that it is feasible to obtain pure Ag films by rf sputtering in a nitrogen discharge. No other phase but Ag was detected by X-ray diffraction (XRD) analysis and nitrogen was not detected in the film by Auger electron spectroscopy. Electrical resistivity was also as low as 2.8 I?Ic cm. Moreover, we found that Ag films thus deposited at a substrate temperature of 100 A°C exhibited preferential orientation of (100), though that of (111) is generally observed in films sputtered in Ar. At other substrate temperatures, the degree of (100) orientation decreased. Consequently, we have found that sputter-deposition by the present method is useful for preparing pure Ag films with texture controlled by selecting the appropriate conditions. |
| 内容記述 |
|
|
内容記述タイプ |
Other |
|
内容記述 |
NOTICE: This is the author's version of a work accepted for publication by Elsevier. Changes resulting from the publishing process, including peer review, editing, corrections, structual formatting and other quality control mechanisms , may not be reflected in this document. Changes may have been to this work since it was submitted for publication. |
| 書誌情報 |
Thin Solid Films
巻 515,
号 2,
p. 540-542,
発行日 2006-10
|
| DOI |
|
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|
識別子タイプ |
DOI |
|
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関連識別子 |
http://doi.org/10.1016/j.tsf.2005.12.292 |
| フォーマット |
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|
内容記述タイプ |
Other |
|
内容記述 |
application/pdf |
| 出版者 |
|
|
出版者 |
Elsevier |
|
言語 |
en |
| 著者版フラグ |
|
|
言語 |
en |
|
値 |
author |
| 出版タイプ |
|
|
出版タイプ |
AM |
|
出版タイプResource |
http://purl.org/coar/version/c_ab4af688f83e57aa |
tsf515_540-.pdf (114.0 kB)
