{"created":"2021-03-01T05:59:37.139904+00:00","id":7168,"links":{},"metadata":{"_buckets":{"deposit":"cfe88e60-a933-413a-8360-4d78b7bc0a9b"},"_deposit":{"id":"7168","owners":[],"pid":{"revision_id":0,"type":"depid","value":"7168"},"status":"published"},"_oai":{"id":"oai:kitami-it.repo.nii.ac.jp:00007168","sets":["1:87"]},"author_link":["44879","36471","36466","36467","36468","36469"],"item_1646810750418":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_3_biblio_info_186":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2004-06","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"3-4","bibliographicPageEnd":"739","bibliographicPageStart":"735","bibliographicVolumeNumber":"74","bibliographic_titles":[{"bibliographic_title":"Vacuum"}]}]},"item_3_description_184":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Ir-Ta alloy thin films were deposited on Si0_2/Si substrates by a magnetron sputtering system using pure Ar as sputtering gas. The lr/Ta composition ratio of the alloy films was varied by changing the number of Ta chips on an lr target. The crystal structure of the alloy films changed from fcc-Ir to lr_3Ta, α-(Ir,Ta), Ta_3Ir, and bcc-Ta with increasing Ta content. Post-deposition annealing of the alloy films was carried out in oxygen at temperatures from 300℃ to 800℃ for 1 hour. The alloy films with Ta contents of 10-50 at.％ indicated low electrical resistivities below 220 μΩcm and the low resistivities were remained after annealing up to 600℃.","subitem_description_type":"Abstract"}]},"item_3_description_194":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_3_full_name_183":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{"nameIdentifier":"44879","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"20261399","nameIdentifierScheme":"KAKEN","nameIdentifierURI":"https://nrid.nii.ac.jp/ja/nrid/1000020261399 "}],"names":[{"name":"阿部, 良夫","nameLang":"ja"}]},{"nameIdentifiers":[{"nameIdentifier":"36471","nameIdentifierScheme":"WEKO"}],"names":[{"name":"佐々木, 克孝","nameLang":"ja"}]}]},"item_3_publisher_212":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"Elsevier"}]},"item_3_relation_191":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://doi.org/10.1016/j.vacuum.2004.01.058","subitem_relation_type_select":"DOI"}}]},"item_3_rights_192":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"http://www.sciencedirect.com/science/journal/0042207X"},{"subitem_rights":"Elsevier, E. Watanabe, Y. Abe, K. Sasaki, S. Iura, Vacuum, 74(3-4), 2004, 735-739."}]},"item_3_select_195":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_select_item":"author"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Watanabe, E.","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Abe, Y.","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Sasaki, K.","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Iura, S.","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2016-11-22"}],"displaytype":"detail","filename":"4657.pdf","filesize":[{"value":"12.4 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"4657.pdf","url":"https://kitami-it.repo.nii.ac.jp/record/7168/files/4657.pdf"},"version_id":"11e1d3ed-8597-41a3-b534-42366cc8b08d"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Characterization of thermally stable Ir-Ta alloy thin films deposited by sputtering","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Characterization of thermally stable Ir-Ta alloy thin films deposited by sputtering","subitem_title_language":"en"}]},"item_type_id":"3","owner":"1","path":["87"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2007-05-10"},"publish_date":"2007-05-10","publish_status":"0","recid":"7168","relation_version_is_last":true,"title":["Characterization of thermally stable Ir-Ta alloy thin films deposited by sputtering"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2022-12-13T02:24:59.562711+00:00"}