| Item type |
学術雑誌論文 / Journal Article(1) |
| 公開日 |
2007-05-10 |
| タイトル |
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タイトル |
Crystallographic effects in micro/nanomachining of single-crystal calcium fluoride |
|
言語 |
en |
| 言語 |
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|
言語 |
eng |
| 資源タイプ |
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資源 |
http://purl.org/coar/resource_type/c_6501 |
|
タイプ |
journal article |
| アクセス権 |
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アクセス権 |
open access |
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アクセス権URI |
http://purl.org/coar/access_right/c_abf2 |
| 著者 |
Yan, Jiwang
Syoji, Katsuo
Tamaki, Jun-ichi
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| 著者別名 |
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識別子Scheme |
WEKO |
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識別子 |
36412 |
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姓名 |
田牧, 純一 |
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言語 |
ja |
| 抄録 |
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内容記述タイプ |
Abstract |
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内容記述 |
Single-crystal calcium fluoride (CaF_2) is an excellent optical material in the infrared range and the ultraviolet range. It is an indispensable substrate material for the 193 and 157 nm wavelength laser optics for future large-scale semiconductor photolithography systems. Due to its delicate nature, for the most part the CaF_2 elements have been fabricated using conventional pitch polishing combined with interferometry and local surface correction to form the desired flat, sphere or aspherical surface. In the present work, the feasibility of generating high quality optical surfaces on CaF_2 by single-point diamond turning is examined. The development of this technology may provide the possibility of fabricating aspherical and diffractive optical components in an efficient way. The machining experiments described in this article were done on a high-stiffness, ultraprecision, numerically controlled diamond lathe with a sharply pointed single-crystal diamond tool. The scale of machining was varied from the micrometer level to the nanometer level. It was found that at the micrometer level, machining was significantly affected by the crystal orientation of the workpiece. The crystallographic anisotropy causes nonuniformity of the finished surface texture, microfracture topography and brittle-ductile transition boundary conditions. The results also indicate that by controlling the undeformed chip thickness below a critical value, namely, the minimum critical chip thickness (85 nm), a uniformly ductile-machined surface could be produced. Under the present experimental conditions, a surface with a maximum height (Ry) of 18.5 nm and arithmetical mean roughness (Ra) of 3.3 nm was obtained. |
| 書誌情報 |
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
巻 22,
号 1,
p. 46-51,
発行日 2004-01
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| DOI |
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識別子タイプ |
DOI |
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関連識別子 |
http://doi.org/10.1116/1.1633770 |
| 権利 |
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|
権利情報 |
The following article appeared in J. Yan, K. Syoji, J. Tamaki, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 22(1), 46-51, (2004) and may be found at http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal& |
| 権利 |
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|
権利情報 |
Copyright 2004 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. |
| フォーマット |
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内容記述タイプ |
Other |
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内容記述 |
application/pdf |
| 出版者 |
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出版者 |
American Institute of Physics |
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言語 |
en |
| 著者版フラグ |
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|
言語 |
en |
|
値 |
publisher |
| 出版タイプ |
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|
出版タイプ |
VoR |
|
出版タイプResource |
http://purl.org/coar/version/c_970fb48d4fbd8a85 |
4357.pdf (4.9 MB)
