2024-03-29T12:32:33Z
https://kitami-it.repo.nii.ac.jp/oai
oai:kitami-it.repo.nii.ac.jp:00008469
2022-12-13T02:22:48Z
1:87
Effects of substrate temperature on structure and mechanical properties of sputter deposited fluorocarbon thin films
Suzuki, Yuta
Fu, Haojie
Abe, Yoshio
Kawamura, Midori
Rf sputtering
Thin film
PTFE
Fluorocarbon
Adhesion strength
Fluorocarbon thin films were formed by radio-frequency magnetron sputtering using a polytetrafluoroethylene target with different substrate temperatures in the range −5 to 200 °C. Using X-ray diffraction and Fourier transform infrared spectroscopy, it was confirmed that the films were amorphous and contained C–F bonds. X-ray photoelectron spectroscopy measurements indicated that the amount of cross-linking in the films increased with increasing substrate temperature. Corresponding to the change in the molecular structure, the adhesion strength of the films to the Si substrate, estimated by micro-scratch testing, improved with increasing substrate temperature.
journal article
Elsevier
2013-01
application/pdf
Vacuum
87
218
221
https://kitami-it.repo.nii.ac.jp/record/8469/files/No_8_Vacuum_87_218.pdf
eng
https://doi.org/10.1016/j.vacuum.2012.05.029
c 2012 Elsevier
open access