2024-03-19T04:23:20Z
https://kitami-it.repo.nii.ac.jp/oai
oai:kitami-it.repo.nii.ac.jp:00007168
2022-12-13T02:24:59Z
1:87
Characterization of thermally stable Ir-Ta alloy thin films deposited by sputtering
Watanabe, E.
Abe, Y.
Sasaki, K.
Iura, S.
Ir-Ta alloy thin films were deposited on Si0_2/Si substrates by a magnetron sputtering system using pure Ar as sputtering gas. The lr/Ta composition ratio of the alloy films was varied by changing the number of Ta chips on an lr target. The crystal structure of the alloy films changed from fcc-Ir to lr_3Ta, α-(Ir,Ta), Ta_3Ir, and bcc-Ta with increasing Ta content. Post-deposition annealing of the alloy films was carried out in oxygen at temperatures from 300℃ to 800℃ for 1 hour. The alloy films with Ta contents of 10-50 at.% indicated low electrical resistivities below 220 μΩcm and the low resistivities were remained after annealing up to 600℃.
application/pdf
journal article
Elsevier
2004-06
application/pdf
Vacuum
3-4
74
735
739
https://kitami-it.repo.nii.ac.jp/record/7168/files/4657.pdf
eng
http://doi.org/10.1016/j.vacuum.2004.01.058
http://www.sciencedirect.com/science/journal/0042207X
Elsevier, E. Watanabe, Y. Abe, K. Sasaki, S. Iura, Vacuum, 74(3-4), 2004, 735-739.
open access