2024-03-29T13:19:00Z
https://kitami-it.repo.nii.ac.jp/oai
oai:kitami-it.repo.nii.ac.jp:00008469
2022-12-13T02:22:48Z
1:87
Effects of substrate temperature on structure and mechanical properties of sputter deposited fluorocarbon thin films
Suzuki, Yuta
Fu, Haojie
Abe, Yoshio
Kawamura, Midori
open access
c 2012 Elsevier
Rf sputtering
Thin film
PTFE
Fluorocarbon
Adhesion strength
Fluorocarbon thin films were formed by radio-frequency magnetron sputtering using a polytetrafluoroethylene target with different substrate temperatures in the range −5 to 200 °C. Using X-ray diffraction and Fourier transform infrared spectroscopy, it was confirmed that the films were amorphous and contained C–F bonds. X-ray photoelectron spectroscopy measurements indicated that the amount of cross-linking in the films increased with increasing substrate temperature. Corresponding to the change in the molecular structure, the adhesion strength of the films to the Si substrate, estimated by micro-scratch testing, improved with increasing substrate temperature.
Elsevier
2013-01
eng
journal article
AM
https://kitami-it.repo.nii.ac.jp/records/8469
https://doi.org/10.1016/j.vacuum.2012.05.029
Vacuum
87
218
221
https://kitami-it.repo.nii.ac.jp/record/8469/files/No_8_Vacuum_87_218.pdf
application/pdf
2.2 MB
2017-01-12