2024-03-29T06:19:24Z
https://kitami-it.repo.nii.ac.jp/oai
oai:kitami-it.repo.nii.ac.jp:00006901
2022-12-13T02:20:00Z
1:87
Optical and electrochromic properties of RF reactively sputtered WO_3 films
Washizu, E.
Yamamoto, A.
Abe, Y.
Kawamura, M.
Sasaki, K.
open access
http://www.sciencedirect.com/science/journal/01672738
Elsevier B.V., E. Washizu, A. Yamamoto, Y. Abe, M. Kawamura and K. Sasaki, Solid State Ionics, 165(1-4), 2003, 175-180.
The effects of deposition conditions, including substrate temperature and sputtering gas pressure, on the optical and electrochromic (EC) properties of WO_3 films prepared by RF reactive sputtering were investigated. The maximum optical band gap energy of 3.15 eV was obtained on a room-temperature substrate temperature, and decreased with increasing substrate temperature. However, the maximum refractive index of about 2.5 was obtained at a sputtering gas pressure of 5 mTorr and a substrate temperature of 500°C, and decreased with decreasing substrate temperature and with increasing pressure. The decrease in bandgap energy and refractive index are thought to have been caused by an increase in WO_3 cluster size and a decrease in film density, respectively. Electrochromic (EC) response times of the WO_3 films were measured in an electrolyte of 1N H_2SO_4 aqueous solution. Fast EC responses were obtained for the WO_3 films with wide band gap energies and low refractive indices. The results indicate that the optical properties of WO_3 films are useful indicators of EC response.
application/pdf
Elsevier
2003-12
eng
journal article
AM
https://kitami-it.repo.nii.ac.jp/records/6901
http://doi.org/10.1016/j.ssi.2003.08.030
Solid State Ionics
165
1-4
175
180
https://kitami-it.repo.nii.ac.jp/record/6901/files/4593.pdf
application/pdf
542.4 kB
2016-11-22