2024-03-29T00:44:38Z
https://kitami-it.repo.nii.ac.jp/oai
oai:kitami-it.repo.nii.ac.jp:00006900
2022-12-13T02:24:54Z
1:87
Effects of thermal treatment on structure and electrical properties of sputtered Ir-W alloy thin films
Abe, Yoshio
Watanabe, Eiji
Sasaki, Katsutaka
Iura, Shigemi
open access
http://www.sciencedirect.com/science/journal/02578972
Elsevier B.V., Yoshio Abe, Eiji Watanabe, Katsutaka Sasaki and Shigemi Iura, Surface and Coatings Technology, 198(1-3), 2005, 148-151.
Thermally and chemically stable electrode films are required for capacitor electrodes of semiconductor memories, such as dynamic random access memories (DRAMs) and ferroelectric random access memories (FeRAMs). In this study, iridium-tungsten (Ir-W) alloy thin films were prepared on SiO_2/Si substrates by RF magnetron sputtering, and the effects of thermal treatment in oxygen atmosphere on the structural and electrical properties of the films were studied. The surface of the as-deposited Ir-W films was very smooth and the films showed low electrical resistivities below 120 μΩcm. The resistances and the smooth surface morphology of the Ir-W (approximately 20 at.%) films remained after thermal treatment up to 600°C in oxygen, which indicates the high thermal stability of the Ir-W alloy thin films.
application/pdf
Elsevier
2005-08
eng
journal article
AM
https://kitami-it.repo.nii.ac.jp/records/6900
http://doi.org/10.1016/j.surfcoat.2004.10.037
Surface and Coatings Technology
198
1-3
148
151
https://kitami-it.repo.nii.ac.jp/record/6900/files/4604.pdf
application/pdf
352.1 kB
2016-11-22