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https://kitami-it.repo.nii.ac.jp/oai
oai:kitami-it.repo.nii.ac.jp:00006899
2022-12-13T02:24:54Z
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Orientation of metal films deposited by sputtering using Ar/N_2 gas mixtures
Kawamura, Midori
Abe, Yoshio
Sasaki, Katsutaka
open access
http://www.sciencedirect.com/science/journal/00406090
Elsevier B.V., Midori Kawamura, Yoshio Abe and Katsutaka Sasaki, Thin Solid Films, 469-470, 2004, 491-494.
The influence of adding N_2 to the sputtering gas on the crystal orientation of metal films was investigated. We observed a crystal orientation change of Ni films from (111) to (100) upon the addition of N_2 into the sputtering gas. The increase of substrate temperature resulted in higher degree of orientation of Ni films. Applying a similar deposition condition, Ag and Cu films were also deposited. However, no change was observed for Ag films. Cu films deposited at room temperature showed orientation change but the crystallinity became poor due to the incorporation of nitrogen. It is considered that the difference in the influence of N_2 addition is a result of the strength of interaction between nitrogen and metals. We must determine the suitable deposition conditions for the orientation change.
application/pdf
Elsevier
2004-12
eng
journal article
AM
https://kitami-it.repo.nii.ac.jp/records/6899
http://doi.org/10.1016/j.tsf.2004.06.175
Thin Solid Films
469-470
491
494
https://kitami-it.repo.nii.ac.jp/record/6899/files/4636.pdf
application/pdf
218.4 kB
2016-11-22